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Volumn 40, Issue 3-4, 1998, Pages 207-221

Electromigration testing of integrated circuit interconnections

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION; MICROSTRUCTURE; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICE TESTING; STATISTICAL METHODS;

EID: 0032207675     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00272-X     Document Type: Article
Times cited : (33)

References (50)
  • 1
    • 85023248653 scopus 로고
    • eds. T.S. Shilliday and J. Vaccaro Rome Air Development Center, Rome
    • I.A. Blech and H. Sello, in: Physics of Failure in Electronics, Vol. 5, eds. T.S. Shilliday and J. Vaccaro (Rome Air Development Center, Rome, 1966), 496.
    • (1966) Physics of Failure in Electronics , vol.5 , pp. 496
    • Blech, I.A.1    Sello, H.2
  • 3
    • 0042174845 scopus 로고    scopus 로고
    • MIL-I-38538, Appendix A. paragraph 30.5.5, Internal conductors
    • MIL-I-38538, Appendix A. paragraph 30.5.5, Internal conductors.
  • 5
    • 0041674144 scopus 로고    scopus 로고
    • Standard guide for design of flat, straight-line test structures for detecting metallization open-circuit or resistance-increase failure due to electromigration
    • F 1259-89, Vol. 10.04
    • Standard Guide for Design of Flat, Straight-Line Test Structures for Detecting Metallization Open-Circuit or Resistance-Increase Failure Due to Electromigration, F 1259-89, Annual Book of ASTM Standards, Vol. 10.04.
    • Annual Book of ASTM Standards
  • 6
    • 4344615994 scopus 로고    scopus 로고
    • Standard test method for estimating electromigration median time-to-failure and sigma of integrated circuit metallizations
    • F 1260-89, Vol. 10.04
    • Standard Test Method for Estimating Electromigration Median Time-To-Failure and Sigma of Integrated Circuit Metallizations, F 1260-89, Annual Book of ASTM Standards, Vol. 10.04.
    • Annual Book of ASTM Standards
  • 10
    • 0342637567 scopus 로고
    • J. R. Lloyd and R. H. Koch, Proc. 25th IEEE International Reliability Physics (1987) 161 and Appl. Phys. Lett., 52 (1988) 194.
    • (1988) Appl. Phys. Lett. , vol.52 , pp. 194
  • 16
    • 0042174837 scopus 로고
    • BTA Technology, Inc.
    • BTABERT User's Manual, 1993-1995, BTA Technology, Inc.
    • (1993) BTABERT User's Manual
  • 50
    • 0029505080 scopus 로고
    • Materials reliability in microelectronics V
    • eds. A.S. Oates, W.F. Filter, R. Rosenberg, A.L. Greer, K. Gadepally
    • A. Scorzoni, I. De Munari, H. Stulens and V. D'Haeger, Materials Reliability in Microelectronics V, eds. A.S. Oates, W.F. Filter, R. Rosenberg, A.L. Greer, K. Gadepally, Materials Research Society Symposium Proceedings, 391 (1995) 513.
    • (1995) Materials Research Society Symposium Proceedings , vol.391 , pp. 513
    • Scorzoni, A.1    De Munari, I.2    Stulens, H.3    D'Haeger, V.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.