The effect of current density and stripe length on resistance saturation during electromigration testing

Applied Physics Letters

Volumn 69, Issue 16, 1996, Pages 2350-2352

  Filippi, R G ^a   Wachnik, R A ^a   Aochi, H ^a   Lloyd, J R ^b   Korhonen, M A ^c  

^a IBM   (United States)

^b Lloyd Technology Associates Inc   (United States)

^c School of Operations Research and Industrial Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001394880     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117521     Document Type: Article

References (9)

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