Low frequency noise evolution during lifetime tests of lines and vias subjected to electromigration

Microelectronics Reliability

Volumn 40, Issue 8-10, 2000, Pages 1323-1327

  Dattilo, V ^a   Neri, B ^a   Ciofi, C ^b  

^a UNIVERSITY OF PISA   (Italy)

^b INFM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009049898     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(00)00159-1     Document Type: Article

References (10)

1. B.Neri, C.Ciofi, V.Dattilo: "Noise and fluctuations in submicrometric Al-Si interconnect lines" IEEE Trans. El. Dev., vol.44, pp.1454-1459, 1997.
2. B.Neri, B.Pellegrini, R.Saletti: "Ultra low noise preamplifier for low frequency noise measurements in electron devices", IEEE Trans. Instr. Meas., vol.40, pp.2-6,1991.
3. C.Ciofi, R.Giannetti, V.Dattilo, B.Neri: Ultra low noise current sources", In: Proc. of IEEE Instrum. and Meas. Technology Conf., IMTC97, Ottawa, Canada, pp. 1485-1489, May 1997.
4. A.Diligenti, P.E.Bagnoli, B.Neri, S.Bea and L.Mantellassi: "A study of electromigration in aluminum and aluminum-silicon thin film resistors using noise technique", Solid State El., vol.32, pp.11-16, 1987.
5. Z.Çelik-Butler, Min Ye: "Prediction of electromigration failure in W/Al-Cu multilayer metallizations by 1/f noise measurements", Solid State El., vol.35, pp.1209-1212, 1992.
6. C.Ciofi, V.Dattilo, B.Neri, S.Foley, A.Mathewson: "Long term noise measurements and MTF test for the characterization of Electromigration in metal lines", Microel. Reliab., vol.39, pp.1691-1696, 1999.
7. L.K.J.Vandamme: 'Noise as a diagnostic tool for quality and reliability of electronic devices", IEEE Trans. El. Dev., vol.41, no.11; pp.2176-2187, 1994.
8. C.Ciofi, I.Ciofi, S.DiPascoli, B.Neri: "Temperature Controlled Oven for Low Noise Measurement Systems" Proc. of IMTC 99, Venice, May 1999.
9. C.Ciofi, M.De Marinis, B. Neri: "Ultralow-Noise PC-Based Measurement System for the Characterization of the Metallizations of Integrated Circuits", IEEE Trans, on Instrum. and Meas.,Vol.46, pp.789-793, 1997.
10. B.Neri, A.Diligenti, P.E.Bagnoli: "Electromigration and low- frequency resistance fluctuations in aluminum thin-film interconnections.", IEEE Trans. El. Dev., vol.ED-34, pp.2317-2322.",1987.