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Volumn 41, Issue 4, 2002, Pages 2163-2170

State-of-the-art reactive pulsed laser deposition of nitrides

Author keywords

Film characterization; Film deposition; Laser ablation; Nitrides; Plasma diagnostics

Indexed keywords

DENSITY (OPTICAL); EPITAXIAL GROWTH; LASER ABLATION; NITRIDING; PLASMA DIAGNOSTICS; PULSED LASER DEPOSITION; TEMPERATURE; THIN FILMS;

EID: 0036529627     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.2163     Document Type: Article
Times cited : (31)

References (89)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.