Effects of substrate temperature on the structure and properties of reactive pulsed laser deposited CNx films

Thin Solid Films

Volumn 280, Issue 1-2, 1996, Pages 1-4

  Ong, C W ^a   Zhao, X A ^a,b   Tsang, Y C ^a   Choy, C L ^a   Chan, P W ^a  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b Shanghai Research Institute of Materials   (China)

Author keywords

Carbon nitride; Electrical conductivity; IR absorption; Optical transmission; Photothermal deflection spectroscopy; Reactive pulsed laser deposition; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

CARBON INORGANIC COMPOUNDS; ELECTRIC PROPERTIES; ENERGY GAP; LIGHT ABSORPTION; OPTICAL PROPERTIES; PULSED LASER APPLICATIONS; SPUTTER DEPOSITION; STRUCTURE (COMPOSITION); SUBSTRATES; THERMAL EFFECTS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; PHOTOTHERMAL DEFLECTION SPECTROSCOPY; REACTIVE PULSED LASER DEPOSITION;

THIN FILMS;

EID: 0030193613     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)00853-X     Document Type: Article

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