Properties of pulsed laser deposited boron nitride films

Applied Surface Science

Volumn 108, Issue 1, 1997, Pages 9-15

  Reisse, Guenter ^a   Weissmantel, Steffen ^a   Keiper, Bernd ^a   Weber, Annekatrin ^a  

^a Hochsch Technik Wirtsch Mittweida   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; EXCIMER LASERS; FILM GROWTH; FILM PREPARATION; ION BOMBARDMENT; LASER ABLATION; NANOSTRUCTURED MATERIALS; PULSED LASER APPLICATIONS; REFRACTIVE INDEX; STOICHIOMETRY;

BORON NITRIDE FILMS; TURBOSTRATIC MICROSTRUCTURE;

BORON COMPOUNDS;

EID: 0030786305     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00590-9     Document Type: Article

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