In situ ellipsometric characterization of SiNx films grown by laser ablation

Journal of Applied Physics

Volumn 84, Issue 9, 1998, Pages 5296-5305

  Samano, E C ^a   Machorro, R ^a   Soto, G ^a   Cota Araiza, L ^a  

^a CENTRO DE CIENCIAS DE LA MATERIA CONDENSADA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000131264     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368778     Document Type: Article

References (34)

1. J. B. Theeten and D. E. Aspnes, Annu. Rev. Mater. Sci. 11, 97 (1981).
2. D. E. Aspnes, Thin Solid Films 89, 249 (1982).
3. N. A. Assadulayev, N. B. Brandt, S. M. Chudinov, S. N. Koslov, and I. Ciric, J. Appl. Phys. 61, 4566 (1987).
4. K. Maeda and I. Umezu, J. Appl. Phys. 70, 2745 (1991).
5. T. Ito, S. Hijiya, T. Nozaki, H. Arakawa, M. Shinoda, and Y. Fukukawa, J. Electrochem. Soc. 125, 448 (1978).
6. Y. Yuehui, L. Xianghuai, F. Ziwei, and Z. Shichang, Appl. Surf. Sci. 40, 145 (1989).
7. B. G. Bovard, J. Ramm, R. Hora, and F. Hanselmann, Appl. Opt. 28, 4436 (1989).
8. M. Gupta, V. K. Rathi, R. Thangaraj, O. P. Agnihotri, and K. S. Chari, Thin Solid Films 204, 77 (1991).
9. S. V. Deshpande, J. L. Dupuie, and E. Gulari, Appl. Phys. Lett. 61, 1420 (1992).
10. P. Boher, Ph. Houdy, L. Hennet, J. P. Delaboudiniere, M. Kühne, P. Müller, Z. G. Li, and D. J. Smith, Opt. Eng. (Bellingham) 30, 1049 (1991).
11. M. F. Lambrinos, R. Valizadeh, and J. S. Colligon, Appl. Opt. 35, 3620 (1996).
12. S. Garcia, J. M. Martin, I. Martil, M. Fernandez, E. Iborra, and G. Gonzalez-Diaz, J. Non-Cryst. Solids 187, 329 (1995).
13. M. A. Rodriguez, N. S. Makhonin, J. A. Escriña, I. P. Borovinskaya, M. I. Osendi, M. F. Barba, J. E. Iglesias, and J. S. Moya, Adv. Mater. 7, 745 (1995).
14. X. Xu, K. Seki, N. Chen, H. Okabe, J. M. Frye, and J. B. Halpern, Mater. Res. Soc. Symp. Proc. 285, 331 (1993).
15. E. Fogarassy, C. Fuchs, A. Slaoui, S. de Unamuno, J. P. Stoquert, W. Marine, and B. Lang, J. Appl. Phys. 76, 2612 (1994).
16. M. L. De Giorgi, G. Leggieri, A. Luches, M. Martino, A. Perrone, G. Majni, P. Mengucci, J. Zemek, and I. N. Mihailescu, Appl. Phys. A: Mater. Sci. Process. 60, 275 (1995).
17. A. Fejfar, J. Zemek, and M. Trchová, Appl. Phys. Lett. 67, 3269 (1995).
18. I. N. Mihailescu, A. Lita, V. S. Teodorescu, A. Luches, M. Martino, A. Perrone, and M. Gartner, J. Mater. Sci. 31, 2839 (1996).
19. See Pulsed Laser Deposition of Thin Films, edited by D. B. Chrisey and G. K. Hubler (Wiley, New York, 1994).
20. D. H. Lowndes, D. B. Geohegan, A. A. Puretzky, D. P. Norton, and C. M. Rouleau, Science 273, 898 (1996).
21. J. Gonzalo, C. N. Afonso, J. Perrière, and R. Gömez San Roman, Appl. Surf. Sci. 96-98, 693 (19996).
22. See Handbook of Optical Constants of Solids, edited by E. D. Palik (Academic, Orlando, FL, 1985).
23. Manual of Spectroscopic Phase Modulated Ellipsometer (ISA Jobin-Yvon, France, 1995).
24. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North Holland, Amsterdam, 1992).
25. W. H. Press, W. T. Vetterling, S. A. Teukolsky, and B. P. Flannery, Numerical Recipes in C (Cambridge University Press, Cambridge, UK, 1978), p. 495.
26. H. R. Phillip, J. Electrochem. Soc. 120, 295 (1973).
27. G. E. Jellison and F. A. Modine, J. Appl. Phys. 76, 3758 (1995).
28. M. Fried, T. Lohner, W. A. M. Aarnink, L. J. Hanekamp, and A. van Silfhout, J. Appl. Phys. 71, 5260 (1992).
29. R. A. Smith, Semiconductors (Cambridge University Press, Cambridge, UK, 1978), p. 495.
30. A. Sassela, Adv. Mater. 8, 349 (1996).
31. A. Nakao, M. Iwaki, H. Sakairi, and K. Terasima, Nucl. Instrum. Methods Phys. Res. B 65, 352 (1992).
32. E. Fogarassy, C. Fuchs, A. Slaoui, S. de Unamauno, J.-P. Stoquert, W. Marine, and B. Lang, Mater. Res. Soc. Symp. Proc. 285, 319 (1993).
33. B. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, (Wiley, New York, 1980), Chap. 2.
34. A. Von Engel, Electric Plasmas: Their Nature and Uses (Taylor and Francis, London, UK, 1983), Chap. 10.