Nitride film deposition by femtosecond and nanosecond laser ablation in low-pressure nitrogen discharge gas

Applied Surface Science

Volumn 154, Issue , 2000, Pages 165-171

  Zhang, Z ^a   Vanrompay, P A ^a   Nees, J A ^a   Clarke, R ^a   Pan, X ^a   Pronko, P P ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; CRYSTAL GROWTH; CRYSTAL ORIENTATION; DEPOSITION; LASER ABLATION; POLYCRYSTALS; PULSED LASER APPLICATIONS; STOICHIOMETRY; SURFACE ROUGHNESS; THIN FILMS; TITANIUM NITRIDE; ULTRAFAST PHENOMENA;

BORON NITRIDE; PULSED LASER DEPOSITION (PLD);

OPTICAL FILMS;

EID: 0033901690     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00381-5     Document Type: Article

References (6)

1. Hubler G.K. Chrisey D.B., Hubler G.K. Pulsed Laser Deposition of Thin Films. 1992;327-355 Wiley, New York.
2. VanRompay P.A., Nantel M., Pronko P.P. Appl. Surf. Sci. 127-129:1998;1023.
3. Willmott P.R., Timm R., Huber J.R. Appl. Surf. Sci. 127-129:1998;105.
4. Hentzell H.T.G., Grovenor C.R.M., Smith D.A. J. Vac. Sci. Technol. A. 2:1984;218.
5. Litvinov D., O'Donnell T., Clarke R. J. Appl. Phys. 85:1999;4.
6. Dolittle L.R. Nucl. Instrum. Methods B. 9:1989;7.