Carbon nitride films deposited by reactive laser ablation

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 481-485

  De Giorgi, M L ^a   Leggieri, G ^a   Luches, A ^a   Martino, M ^a   Perrone, A ^a   Zocco, A ^a   Barucca, G ^a   Majni, G ^a   Gyorgy, E ^b   Mihailescu, I N ^b   Popescu, M ^b  

^a INFM   (Italy)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Carbon nitride; Laser ablation; Reactive ablation; Thin films

Indexed keywords

CHEMICAL BONDS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DEPOSITION; GRAPHITE; LASER ABLATION; LASER PRODUCED PLASMAS; LIGHT EMISSION; PRESSURE EFFECTS; SILICON; THERMAL EFFECTS;

CARBON NITRIDE; REACTIVE ABLATION;

NITRIDES;

EID: 0032070601     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00678-8     Document Type: Article

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