A parametric study of the deposition of the TiN thin films by laser reactive ablation of titanium targets in nitrogen: The roles of the total gas pressure and the contaminations with oxides

Journal of Materials Science

Volumn 31, Issue 11, 1996, Pages 2909-2915

  Mihailescu, I N ^a   Gyorgy, E ^a   Chitica, N ^a   Teodorescu, V S ^a   Mavin, G ^a   Luches, A ^b   Perrone, A ^b   Martino, M ^b   Neamtu, J ^c  

^a INSTITUTE OF ATOMIC PHYSICS   (Romania)

^b UNIVERSITY OF SALENTO   (Italy)

^c UNIVERSITY OF CRAIOVA   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EXCIMER LASERS; LASER ABLATION; THIN FILMS;

TITANIUM NITRIDE THIN FILMS;

TITANIUM NITRIDE;

EID: 0030166136     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00356001     Document Type: Article

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