Influence of ion-beam energy and substrate temperature on the synthesis of carbon nitride thin films by nitrogen-ion-assisted pulsed laser deposition

Journal of Applied Physics

Volumn 86, Issue 9, 1999, Pages 4954-4958

  Lu, Y F ^a   Ren, Z M ^a   Chong, T C ^a   Cheong, B A ^b   Pang, S I ^b   Wang, J P ^b   Li, K ^c  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

^c INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000864184     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371465     Document Type: Article

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