Deposition of carbon nitride films by reactive pulsed-laser ablation at high fluences

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 582-585

  Zocco, A ^a   Perrone, A ^a   D'Anna, E ^a   Leggieri, G ^a   Luches, A ^a   Klini, A ^b   Zergioti, I ^b   Fotakis, C ^b  

^a UNIVERSITY OF SALENTO   (Italy)

^b UNIVERSITY OF CRETE   (Greece)

Author keywords

Bonding; Laser; Nitrides; Nitrogen

Indexed keywords

CHEMICAL BONDS; DEPOSITION; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER ABLATION; MOLECULAR STRUCTURE; PULSED LASER APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; PULSED LASER ABLATION;

NITRIDES;

EID: 0032607176     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00357-4     Document Type: Article

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