Effects of background gas-plume interaction in the deposition of SiN x films

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 1005-1010

  Samano, E C ^a   Machorro, R ^a   Soto, G ^a,b   Cota Araiza, L ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b CENTRO DE INVESTIGACIÓN CIENTÍFICA Y DE EDUCACIÓN SUPERIOR DE ENSENADA   (Mexico)

Author keywords

Background gas plume collision; Ellipsometry; Laser ablation; Silicon nitride

Indexed keywords

DEPOSITION; ELLIPSOMETRY; FILM GROWTH; LASER ABLATION; PHOTONS; PRESSURE EFFECTS; STOICHIOMETRY; TRANSMISSION ELECTRON MICROSCOPY; VOLUME FRACTION;

BACKGROUND GAS PLUME COLLISION;

SILICON NITRIDE;

EID: 0032075456     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00782-4     Document Type: Article

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