Room-temperature growth of high-purity titanium nitride by laser ablation of titanium in a nitrogen atmosphere

Surface and Coatings Technology

Volumn 110, Issue 3, 1998, Pages 153-157

  Gu, H D ^a   Leung, K M ^a   Chung, C Y ^a   Han, X D ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Compound parameter; Pulsed laser deposition; TiN thin films

Indexed keywords

DEPOSITION; EXCIMER LASERS; FILM GROWTH; GRAIN SIZE AND SHAPE; LASER ABLATION; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PULSED LASER DEPOSITION;

PROTECTIVE COATINGS;

EID: 0040366291     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00690-2     Document Type: Article

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