Deposition of CN thin films by reactive pulsed laser ablation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3405, Issue , 1998, Pages 130-142

  Perrone, Alessio ^a  

^a UNIVERSITY OF SALENTO   (Italy)

Author keywords

Carbon nitride thin films; Graphite; IR absorption; Laser ablation; Mass spectra; Optical emission spectra; Rutherford backscattering; X ray photoelectron spectroscopy

Indexed keywords

ABLATION; ABSORPTION; ABSORPTION SPECTROSCOPY; AUGER ELECTRON SPECTROSCOPY; BACKSCATTERING; CARBON FILMS; CARBON NITRIDE; DESORPTION; DROPS; ELECTRON SPECTROSCOPY; ELECTRONS; EMISSION SPECTROSCOPY; FOURIER TRANSFORMS; GAS ABSORPTION; GRAPHITE; INFRARED ABSORPTION; INFRARED SPECTROSCOPY; LASER ABLATION; LASER APPLICATIONS; LASERS; LIGHT; LIGHT EMISSION; MASS SPECTROMETERS; MASS SPECTROMETRY; NITRIDES; OPTICAL EMISSION SPECTROSCOPY; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SCATTERING; SOLIDS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; THIN FILMS;

CARBON NITRIDE THIN FILMS; IR ABSORPTION; MASS SPECTRA; OPTICAL EMISSION SPECTRA; RUTHERFORD BACKSCATTERING;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 58149240003     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312744     Document Type: Conference Paper

References (33)

1. A.Y. Liu and M.L. Cohen, "Prediction of new low compressibility solids", Science, 245, 841-842, 1989
2. R.B. Jackman and L.H. Chua, "Diamond-like carbon within microelectronics: dielectric properties on silicon and GaAs", Diam. Relat. Mater. 1, 895-899, 1992
3. B. Singh, S. McClelland, F. Tams III, B. Halon, O. Mesker and D. Furst, "Use of black diamond-like carbon films as a contrast enhancement layer for liquid-crystal displays", Appl. Phys. Lett. 57, 2288-2290, 1990
4. A.Z. Khan, J.A. Woollam and Y. Chung, "Interfacial effect due to the tunnelling to insulator gap states in amorphous carbon on silicon metal-insulator-semiconductor structure", J. Appl. Phys. 55, 4299-4303, 1984
5. G. Zhang, L.G. Guo, Z. Liu and X. Cheng, "Application of diamond-like carbon films as protection and antireflection coatings of ZNS elements", Opt. Eng. 33, 1330-1333, 1994
6. H. Han and B.J. Feldman, "Structural and optical properties of amorphous carbon nitride", Solid State Commun. 65, 921-923, 1988
7. J.H. Kaufman and S. Metin, "Symmetry breaking in nitrogen doped amorphous carbon: infrared observation of the Raman-active G and D bands", Phys. Rev. B39, 13053-13060, 1989
8. F. Fujimoto and K. Ogata, "Formation of carbon nitride films by means of ion assisted dynamic mixing (IVD) method", Jpn. J. Appl. Phys. 32, L420-423, 1993
9. D. Marton, A.H. Al-Bayati, S.S. Todoroc, K.J. Boyd and J.W. Rabalais, "Synthesis of carbon-nitride films using a fast switched dual-source low energy ion beam deposition system", Nucl. Istrum. Methods, Phys. Rev. B90, 277-281, 1994
10. I. Gouzman, R. Brener and A. Hoffman, "Carbon nitride formation by low-energy nitrogen implantation into graphite", Thin Solid Films. 253, 90-94, 1994
11. D. Marton, K.J. Boyd, A.H. Al-Bayati, S.S. Todorov and J.W. Rabalais, "Carbon nitride deposited using energetic species: a two-phase system", Phys. Rev. Lett. 73, 118-121, 1994
12. M.R. Wixom, "Chemical preparation and shock wave preparation of carbon nitride precursors", J. Am. Ceram. Soc. 73, 1973-1978, 1990
13. C.J. Torng, J.M. Silversten, J.H. Judi and C. Chang. "Structure and bonding studies of the C:N thin films produced by rf sputtering", J. Mater. Res. 5, 2490-2496, 1990
14. D. Li, Y.W. Chung, M.S. Wong, and W.D. Sproul, "Nano-indentation studies of ultrahigh strength carbon nitride thin films ", J. Appl. Phys. 74, 219-223 1993
15. A. Luches, A.P. Caricato, G. Leggieri, M. Martino, A. Perrone, G. Barucca, P. Mengucci and J. Zemek, "Laser reactive ablation deposition of carbon nitride thin films", SPIE Proc. 2789, 293-304, 1996
16. E. D'Anna, A. Luches, A. Perrone, S. Acquaviva, R. Alexandrescu, I.N. Mihailescu, J. Zemek and G. Majni, "Deposition of C-N films by reactive laser ablation", Appl. Surf. Science, 106, 126-131, 1996.
17. C. Niu, Y.Z. Lu and C.M. Lieber, "Experimental realisation of the covalent solid carbon nitride", Science, 261, 334-337, 1993
18. Z.M. Ren, Y.C. Du, Y. Qiu, J.D. Wu, Z.F. Ying, X.X. Xiong and F.M. Li, "Carbon nitride films synthesised by combined ion beam and laser ablation processing", Phys. Rev. B51, 5274-5277, 1995
19. 4", Phys. Rev. B49, 5034-5037, 1994
20. 4 phase by dual ion beam sputtering deposition", Mater. Letters, 22, 115, 1995
21. W.T. Zheng, K.Z. Xing, N. Hellgren, M. Logdlund, A. Johansson, U. Gelivs, W.R. Salanek and J.E. Sundgreen, "Nitrogen 1s electron binding energy assigment in carbon nitride thin films with different structures", Journal of Elect. Spectr. and Relat. Phenom. (in press)
22. Y. Mizokawa, T. Miyasato, S. Nakamura, K.M. Geib and C.W. Wilmsen, "The CKLL first - derivative X-ray photoelectron spectroscopy spectra as a fingerprint of the carbon state and the characterisation of diamond-like carbon films ", J. Vac. Sci. Technol. A5, 2809-2813, 1987
23. S. Kumar, K.S.A. Butcher and T.L. Tansley, "X-ray photoelectron spectroscopy characterization of radio frequency reactively sputtered carbon nitride thin films", J. Vac. Sci. Technol. A14, 2687-2692, 1996
24. L.R. Doolittle, "Algorithms for the rapid simulation of Rutherford backscattering spectra", Nuclear Instrum. Method, B9, 344-351, 1985
25. R.K. Singh and J. Narajan, "Pulsed-laser evaporation technique for deposition of thin films: Physics and theoretical model", Phys. Rev. B41, 8843-8859, 1990
26. P. Gonzalez, R. Soto, E.G. Parada, X. Redondas, S. Chiussi, J. Serra, J. Pou, B. Leon and M. Perez-Amor, "Carbon nitride films prepared by excimer laser ablation", Appl. Surf Science, 3819, 380-383, 1996
27. Z.J. Zhang, S. Fan and C.M. Lieber, "Growth and composition of covalent carbon nitride solids", Appl. Phys. Lett. 66, 3582-3584, 1995
28. P. Hammer, M.A. Baker, C. Lenardi and W. Gissler, "Synthesis and properties of carbon nitride films deposited using a dual ion beam method", Vuoto, 26, 38-41, 1997
29. C.W. Ong, X.A. Zhao, Y.C. Tsang, C.L. Choy and P.W. Chan, "Effects of substrate temperature on the structure and properties of reactive pulsed laser deposited CNx films", Thin Solid Films, 280, 1-4, 1996
30. 4", Phys. Rev. B41, 10727-10734, 1990
31. S. Veprek, "Transport of carbon in non-isothermal low pressure nitrogen plasma", Z. Phys. Chem. 86, 95-107, 1973
32. E. Aldea, A.P. Caricato, G. Dinescu, A. Luches and A. Perrone, "Optical emission diagnostic of laser-induced plasma during CNx film deposition", Jpn. J. Appl. Phys. 36, 4686-4689, 1997
33. S. Aquaviva, A.P. Caricato, M.L. De Giorgi, A. Luches and A. Perrone, "Spectroscopic studies during pulsed laser ablation deposition of C-N films", Appl. Surf. Science, 109/110, 408-412, 1997.