CNx films created by combined laser deposition and r.f. discharge: XPS, FTIR and Raman analysis

Thin Solid Films

Volumn 366, Issue 1-2, 2000, Pages 69-76

  Jelinek M ^a   Zemek, J ^a   Trchova M ^b   Vorlicek V ^a   Lancok J ^a   Tomov, R ^c   Simeckova M ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b CHARLES UNIVERSITY   (Czech Republic)

^c INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS FILMS; CHEMICAL BONDS; DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROHARDNESS; NITROGEN; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; PULSE LASER DEPOSITION; RADIO FREQUENCY DISCHARGE;

THIN FILMS;

EID: 0041710593     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00853-1     Document Type: Article

References (55)

1. Liu A.Y., Cohen M.L. Science. 245:1989;841.
2. Cohen M.L. Science. 231:1993;307.
3. Cohen M.L. Phys. Rev. B 32:1985;7988.
4. Liu A.Y., Cohen M.L. Phys. Rev. B. 41:1990;10727.
5. Sung C.M., Sung M. Mater. Chem. Phys. 43:1996;1.
6. Demichelis F., Rong X.F., Schreiter S., Tagliaferro A., De Martino C. Diam. Rel. Mater. 4:1995;361.
7. Zhao X.-A., Ong C.W., Tsang Y.C., Wong Y.W., Chan P.W., Choy C.L. Appl. Phys. Lett. 66:(20):1995;2652.
8. Kobayashi S., Nozaki S., Morisaki H., Fukui S., Masaki S. Thin Solid Films. 281-282:1966;289.
9. Yen Tyan-Ywan, Chou Chang-Pin. Appl. Phys. Lett. 67:1995;2801.
10. Wada N., Solin S.A., Wong J., Prochazka S. J. Non-Cryst. Solids. 43:1987;7.
11. Yu K.M., Kohen M.L., Haller E.E., Hansen W.L., Liu A.Y., Wu I.C. Phys. Rev. B. 49:1994;5034.
12. Sjöström H., Ivanov I., Johansson M., et al. Thin Solid Films. 246:1994;103.
13. Chen Yan, Guo Liping, Wang E.G. Mod. Phys. Lett. B. 10:1996;615.
14. Zheng W.T., Broitman E., Hellgren N., et al. Thin Solid Films. 308-309:1997;223.
15. D'Anna E., Luches A., Perrone A., et al. Appl. Surf. Sci. 106:1996;126.
16. Alexandrescu R., Gireasa R., Pugna G., et al. Appl. Surf. Sci. 109/110:1997;544.
17. Jelínek M., Lančok J., Jastrabík L., Soukup L., Šimečková M., Zelinger Z. Superficies y vacio. 9:1999;303.
18. SAMx-STRATA manual. Software Version 1.2, ONERA report TP 1990-109, France.
19. Pouchou J.L., Pichoir F.M.A. Microbeam Analysis 1988. Newbury D.E. Proc. 23rd Annu. Conf. Microbeam Analysis Society, Milwaukee, WI. 1988;315.
20. Pouchou J.L., Pichoir F., Boivin D. Jasjenska S., Maksymovicz L.J. Proc. 12th ICXOM, Cracow, Poland. 1989;52.
21. Moulder J.F., Sticke W.F., Sobol P.E., Bomben K.D. Handbook of X-ray Photoelectron Spectroscopy. 1992;Perkin Elmer Co, Eden Prairie.
22. Band I.M., Kharitonov Yu.I., Trzhaskovskaya M.B. Atomic Data Nucl. Data Tables. 23:1979;443.
23. Tanuma S., Powel C.J., Penn D.R. Surf. Sci. 192:1987;L849.
24. Jiříček P. Czech. J. Phys. 44:1994;261.
25. Jin Y.-S., Shibata T., Matsuda Y., Fujiyama H. Jpn. J. Appl. Phys. 37:1998;L1260.
26. J. Zemek, M. Jelínek, V. Vorlíček, M. Trchová, J. Lančok, Diam. Rel. Mater. (to be published).
27. Kulisch W., Delplancke-Ogletree M.P., Buliř J., et al. Diam. Rel. Mater. 8:1999;1039.
28. Tabbal M., Merel P., Moisan S., Chaker M., Gat E., Richard A., Moisan M., Gujrathi S. Surf. Coat. Technol. 98:1998;1092.
29. Souto S., Alvarez F. Appl. Phys. Lett. 70:1997;1539.
30. Hammer P., Victoria N.M., Alvarez F. J. Non-Cryst. Solids. 227-230:1998;645.
31. Sjöström H., Stafström S., Boman M., Sundgren J.-E. Phys. Rev. Lett. 75:1995;1336.
32. Hsu C.-Y., Hong F.C.-N. Jpn. J. Appl. Phys. 37:1998;L675.
33. Kaufman J.H., Metin S., Saperstein D.D. Phys. Rev. B. 39:1989;39.
34. Hammer P., Baker M.A., Lenardi C., Gissler W. J. Vac. Sci. Technol. A. 15:1997;107.
35. Kumar S., Tansley T.L. Thin Solid Films. 256:1995;44.
36. Nakayama N., Tsuchya Y., Tamada S., et al. Jpn. J. Appl. Phys. 32:1993;1465.
37. Kaltofen R., Sebald T., Weise G. Thin Solid Films. 308-309:1997;118.
38. Vepřek S., Weidmann J., Glatz F. J. Vac. Sci. Technol. A. 13:1995;2914.
39. Enders B., Horino Y., Tsubouchi N., Chyahara A., Kinomura A., Fujii K. Nucl. Instrum. Methods Phys. Res. B. 121:1997;73.
40. Weich F., Widany J., Frauenheim Th. Phys. Rev. Lett. 78:1997;3326.
41. Vorlíȳek V., S̄iroký P., Sobota J., Peřina V., Železný V., Hrdina J. Diamond Relat. Mater. 5:1996;570-574.
42. Bulíř J., Jelínek M., Vorlíček V., Zemek J., Peřina V. Thin Solid Films. 292:1997;318-323.
43. Lacerda M.M., Franceschini D.F., Freire F.L. Jr., Achete C.A., Mariotto G. J. Vac. Sci. Technol. A. 15:1997;1970.
44. Werninghaus T., Zahn D.R.T., Wang E.G., Chen Y. Diam. Rel. Mater. 7:1998;52.
45. Yen T.-Y., Chou C.-P. Solid State Commun. 95:1995;281.
46. Oral B., Hauert R., Müller U., Ernst K.-H. Diam. Rel. Mater. 4:1995;482.
47. Tamor M.A., Vasell W.C. J. Appl. Phys. 76:1994;3823.
48. Doyle T.E., Dennison J.R. Phys. Rev. B. 51:1995;196.
49. Al-Jishi R., Dresselhaus G. Phys. Rev. B. 26:1982;4514.
50. Wixom M.R. J. Am. Ceram. Soc. 73:1990;1973.
51. Narayan J., Reddy J., Biunno N., Kanetkar S.M., Tiwari P., Parikh N. Mater. Sci. Eng. B. 26:1994;49.
52. Boussetta A., Lu M., Bensaoula A., Schultz A. Appl. Phys. Lett. 65:(6):1994;698.
53. Stanishevski A., Kriachtchev L., Akula I. Diam. Rel. Mater. 7:1998;1190.
54. Xu S., Hundhausen M., Ristein J., Yan B., Ley L. J. Non-Cryst. Solids. 164-168:1993;1127.
55. Pastrňák J., Oswald J., Petříček O., Ovsyuk V.N. Phys. Stat. Sol. (a). 118:1990;317.