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Volumn 27, Issue , 2007, Pages 211-228

Point Defects in Stacks of High-κ Metal Oxides on Ge: Contrast with the Si Case

Author keywords

Electron Spin Resonance; Electron Spin Resonance Signal; Interface Trap; Point Defect; Trap Density

Indexed keywords


EID: 84982810772     PISSN: 14370387     EISSN: 21976643     Source Type: Book Series    
DOI: 10.1007/978-3-540-71491-0_9     Document Type: Chapter
Times cited : (4)

References (64)
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    • Hutcheson, G.D.1
  • 2
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    • (SIA, San Jose, CA
    • The International Technology Roadmap for Semiconductors edn 2003 (SIA, San Jose, CA); http://public.itrs.net/
    • (2003)
  • 8
    • 3042715207 scopus 로고    scopus 로고
    • edited by M. Houssa (Institute of Physics Publishing, Bristol
    • High-κ gate dielectrics, edited by M. Houssa (Institute of Physics Publishing, Bristol, 2004).
    • (2004) High-κ Gate Dielectrics
  • 9
    • 33846953466 scopus 로고    scopus 로고
    • edited by H.R. Huff and D.C. Gilmer, (Springer Series in Advanced Microelectronics, 2004)
    • High Dielectric Constant Materials: VLSI MOSFET Applications, edited by H.R. Huff and D.C. Gilmer, (Springer Series in Advanced Microelectronics, 2004).
    • High Dielectric Constant Materials: VLSI MOSFET Applications
  • 51
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    • A. Stesmans, Appl. Phys. Lett. 68, 2076 (1996); 68, 2723 (1996).
    • (1996) Appl. Phys. Lett , vol.68 , pp. 2076
    • Stesmans, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.