SiGe/SiGeO2 interface defects

Thin Solid Films

Volumn 294, Issue 1-2, 1997, Pages 242-245

  Lebib, S ^a   Schoisswohl, M ^a   Cantin, J L ^a   Von Bardeleben, H J ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

Germanium; Interfaces; Oxides; Silicon

Indexed keywords

CRYSTAL DEFECTS; ELECTRON SPIN RESONANCE SPECTROSCOPY; INTERFACES (MATERIALS); OXIDATION; OXIDES; SEMICONDUCTING FILMS; SEMICONDUCTING GERMANIUM COMPOUNDS;

INTERFACE DEFECTS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0031073492     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09244-9     Document Type: Article

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