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Volumn 73, Issue 2, 2013, Pages 303-315

Recent progress in negative-working photosensitive and thermally stable polymers

Author keywords

Chemical amplification; Negative working; Photoacid generator; Photobase generator; Photosensitive; Thermally stable polymer

Indexed keywords

CHEMICAL AMPLIFICATION; NEGATIVE-WORKING; PHOTOACID GENERATORS; PHOTOBASE GENERATOR; PHOTOSENSITIVE; THERMALLY STABLE POLYMERS;

EID: 84872600946     PISSN: 13815148     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.reactfunctpolym.2012.04.020     Document Type: Conference Paper
Times cited : (24)

References (102)
  • 21
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    • 84872614461 scopus 로고    scopus 로고
    • US Patent, 7087945
    • J. Nakai, T. Aoki, US Patent, 7087945, 2006.
    • (2006)
    • Nakai, J.1    Aoki, T.2
  • 81
    • 49049097921 scopus 로고    scopus 로고
    • Microlithography: Science and technology
    • K. Suzuki, B.W. Smith (Eds.)
    • T. Ueno, R.D. Allen, Microlithography: science and technology, second ed., in: K. Suzuki, B.W. Smith (Eds.), Optical Science and Engineering 126, CRC Press, 2007, pp. 503-585.
    • (2007) Optical Science and Engineering 126, CRC Press , pp. 503-585
    • Ueno, T.1    Allen, R.D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.