An alkaline-developable, negative-working photosensitive polybenzoxazole based on poly(o-hydroxyamide), a vinyl sulfone-type cross-linker, and a novel photobase generator

Macromolecules

Volumn 42, Issue 11, 2009, Pages 3780-3787

  Mizoguchi, Katsuhisa ^a   Higashihara, Tomoya ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

[CARBONYL; AIR ATMOSPHERE; ALIPHATIC CHAINS; ALKALINE-DEVELOPABLE; AQUEOUS SOLUTIONS; CROSSLINKER; FABRICATION PROCESS; HIGH CONTRAST; HIGH THERMAL STABILITY; LOW DIELECTRIC CONSTANTS; NEGATIVE-WORKING; PHOTOACID GENERATORS; PHOTOBASE GENERATOR; PHOTOSENSITIVE POLYBENZOXAZOLE; POST-EXPOSURE; TETRAMETHYL AMMONIUM HYDROXIDE; VINYL SULFONES;

CORROSION; FABRICS; HEXANE; LIGHT SENSITIVE MATERIALS; MECHANICAL PROPERTIES; MICROPROCESSOR CHIPS; PHOTOSENSITIVITY; POLYMER FILMS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES; THICK FILMS;

WATER ABSORPTION;

EID: 66749139617     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma900258j     Document Type: Article

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