Recent development of photosensitive polybenzoxazoles

Polymer Journal

Volumn 38, Issue 5, 2006, Pages 405-418

  Fukukawa, Ken Ichi ^a   Ueda, Mitsuru ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Catalyst; Low Temperature Cyclization; Photoacid Generator; Photosensitive Compound; Photosensitive Polybenzoxazole; Poly(o hydroxy amide)

Indexed keywords

CATALYST; LOW TEMPERATURE CYCLIZATION; PHOTOACID GENERATOR; PHOTOSENSITIVE COMPOUND; PHOTOSENSITIVE POLYBENZOXAZOLE; POLY(O-HYDROXY AMIDE);

INSULATING MATERIALS; MICROELECTRONIC PROCESSING; NITROGEN COMPOUNDS; ORGANIC SOLVENTS;

ORGANIC POLYMERS;

EID: 33745739782     PISSN: 00323896     EISSN: 13490540     Source Type: Journal    
DOI: 10.1295/polymj.38.405     Document Type: Review

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