Direct patterning of poly(ether ether sulfone) using a cross-linker and a photoacid generator

Polymer Journal

Volumn 40, Issue 7, 2008, Pages 645-650

  Mizoguchi, Katsuhisa ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Cross linker; Photoacid generator; Photosensitive polymer; Poly(ether ether sulfone)

Indexed keywords

ABS RESINS; PHENOLS; PHOTORESISTORS;

CROSS-LINKER; PHOTOACID GENERATOR; PHOTOSENSITIVE POLYMER; POLY(ETHER ETHER SULFONE);

ORGANIC COMPOUNDS;

EID: 50649104861     PISSN: 00323896     EISSN: 13490540     Source Type: Journal    
DOI: 10.1295/polymj.PJ2008011     Document Type: Article

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