Novel photoacid generators

Journal of Photopolymer Science and Technology

Volumn 13, Issue 2, 2000, Pages 223-230

  Asakura, Toshikage ^a   Yamato, Hitoshi ^a   Ohwa, Masaki ^a  

^a CIBA GEIGY LTD   (Switzerland)

Author keywords

DUV; g line; Halogen free; i line; Non ionic; PAG

Indexed keywords

ACID; PHENOL DERIVATIVE; POLYMER;

ARTICLE; CHEMICAL ANALYSIS; MATERIALS; MATERIALS TESTING; PHOTOCHEMISTRY; QUANTUM CHEMISTRY; STORAGE; THERMOSTABILITY;

EID: 0034584792     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.13.223     Document Type: Article

References (10)