An alkaline-developable, chemically amplified, negative-type photosensitive poly(benzoxazole) resist based on poly(o-hydroxyamide), an active ester-type cross-linker, and a photobase generator

Macromolecules

Volumn 42, Issue 4, 2009, Pages 1024-1030

  Mizoguchi, Katsuhisa ^a   Higashihara, Tomoya ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

2-NITROBENZYL; [CARBONYL; ACTIVE ESTERS; ALKALINE DEVELOPER; ALKALINE-DEVELOPABLE; AQUEOUS SOLUTIONS; BENZOXAZOLE; CROSSLINKER; HIGH SENSITIVITY; HIGH THERMAL STABILITY; LOW DIELECTRIC; NEGATIVE IMAGE; PHOTOACID GENERATORS; PHOTOBASE GENERATOR; POST-EXPOSURE; RESIST FILMS; RESIST SYSTEMS; TETRAMETHYL AMMONIUM HYDROXIDE; UV LIGHT;

AMIDES; CORROSION; ESTERIFICATION; ESTERS; LIGHT SENSITIVE MATERIALS; MECHANICAL PROPERTIES; MICROPROCESSOR CHIPS; PHOTOSENSITIVITY;

WATER ABSORPTION;

EID: 66549087263     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma802349b     Document Type: Article

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