New convenient synthetic route for photosensitive poly(benzoxazole)

Journal of Photopolymer Science and Technology

Volumn 16, Issue 2, 2003, Pages 237-242

  Ueda, Mitsuru ^a   Ebara, Kazuya ^a   Shibasaki, Yuji ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

High temperature materials; Imaging; Photolithography; Poly (o hydroxyamide); Poly(benzoxazole); Poly(o hydroxyazomethine)

Indexed keywords

1 METHYL 2 PYRROLIDINONE; 1 [1,1 BIS[4 (2 DIAZO 1(2H) NAPHTHALENONE 5 SULFONYLOXY)PHENYL]ETHYL] 4 [1 [4 (2 DIAZO 1(2H) NAPHTHALENONE 5 SULFONYLOXY)PHENYL]METHYLETHYL]BENZENE; 2,2 BIS(3 AMINO 4 HYDROXYPHENYL)HEXAFLUOROPROPANE; ALDEHYDE DERIVATIVE; BENZOXAZOLE DERIVATIVE; DIPHENYLISOPHTHALATE; ISOPHTHALALDEHYDE; POLY(2 HYDROXYAMIDE); POLY(2 HYDROXYAZOMETHINE); POLY(BENZOXAZOLE); POLYMER; TOLUENE; UNCLASSIFIED DRUG;

ANALYTIC METHOD; CHEMICAL COMPOSITION; CHEMICAL STRUCTURE; PHOTOACTIVATION; POLYMERIZATION; REVIEW; SENSITIVITY ANALYSIS; STRUCTURE ANALYSIS; SYNTHESIS; TEMPERATURE;

EID: 0037830532     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.237     Document Type: Review

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