Alkaline-developable, chemically amplified, negative-type photosensitive polyimide based on polyhydroxyimide, a crosslinker, and a photoacid generator

Journal of Applied Polymer Science

Volumn 113, Issue 6, 2009, Pages 3605-3611

  Saito, Yuta ^a   Mizoguchi, Katsuhisa ^a   Higashihara, Tomoya ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Dielectric properties; Photoresists; Polyimides

Indexed keywords

2-AMINOPHENOL; ALKALINE-DEVELOPABLE; CROSSLINKER; HEXAFLUOROISOPROPYLIDENE; HIGH SENSITIVITY; HIGH TRANSPARENCY; LINE-AND-SPACE PATTERNS; LOW DIELECTRIC CONSTANTS; LOW TEMPERATURES; NEGATIVE TONES; PHOTO-SENSITIVE POLYIMIDE; PHOTOACID GENERATORS;

ACETONITRILE; CERAMIC CAPACITORS; DIELECTRIC WAVEGUIDES; METHANOL; NEMATIC LIQUID CRYSTALS; PERMITTIVITY; PHENOLIC RESINS; PHENOLS; PHOTORESISTORS; PHOTORESISTS; PHOTOSENSITIVITY; POLYIMIDES; SURFACE TREATMENT;

LIGHT SENSITIVE MATERIALS;

ALKALI TREATMENT; CROSS LINKING AGENT; DIELECTRIC PROPERTY; POLYIMIDE; TEMPERATURE EFFECT;

EID: 67649494600     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.30358     Document Type: Article

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