Synthesis of a highly transparent poly(o-hydroxyamide) in the i-line region and its application to photosensitive polymers

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 43, Issue 12, 2005, Pages 2527-2535

  Toyokawa, Fumihiro ^a   Fukukawa, Ken Ichi ^a   Shibasaki, Yuji ^a   Ando, Shinji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Charge transfer; Density functional theory; I line lithography; Photoresists; Photosensitive polybenzoxazole; Transparency

Indexed keywords

CHARGE TRANSFER; LITHOGRAPHY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTORESISTORS; PHOTOSENSITIVITY; PROBABILITY DENSITY FUNCTION; SYNTHESIS (CHEMICAL); TRANSPARENCY;

I-LINE LITHOGRAPHY; PHOTOPOLYMERS; PHOTOSENSITIVE POLYBENZOXAZOLE; PHOTOSENSITIVE POLYMERS;

POLYMERS;

EID: 20844457161     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.20729     Document Type: Article

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