Development of negative-type photosensitive semi-alicyclic polyimide using a photobase generator

Journal of Photopolymer Science and Technology

Volumn 20, Issue 2, 2007, Pages 181-186

  Mizoguchi, Katsuhisa ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Photobase generator; Photoresist; Photosensitive polymer; Polyimides

Indexed keywords

EID: 34548634657     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.181     Document Type: Article

References (7)

1. "Polyimides fundamentals and applications", M. K. Ghosh, and K. L. Mittal, Ed., Marcel Dekker: New York, 1996.
2. "Photosensitive Polyimides fundamentals and applications" K. Horie, and T. Yamashita, Ed., Technomic, Lancaster, 1995.
3. Y. Watanabe, Y. Shibasaki, S. Ando, and M. Ueda, Polym. J., 37, 270 (2005).
4. Y. Watanabe, K. Fukukawa, Y. Shibasaki, and M. Ueda, J. Polym. Sc: Part A. Polym. Chem., 43, 593 (2005).
5. K. Sakayori, Y. Shibasaki, and M. Ueda, Polym. J., 38, 1189 (2006).
6. K. Fukukawa, Y. Shibasaki, and M. Ueda, Polym. Adv. Technol. 17,131-136 (2006)
7. A. Mochizuki, T. Teranishi, and M. Ueda, Macromolecules, 28, 365 (1995).