Photosensitive poly (benzoxazole) based on precursor from diphenyl isophthalate and bis(o-aminophenol)

Polymer

Volumn 44, Issue 2, 2002, Pages 333-339

  Ebara, Kazuya ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Photosensitive poly(benzoxazole); Poly(o hydroxyamide); Thermally stable polymer

Indexed keywords

AROMATIC COMPOUNDS; PHOTOSENSITIVITY; POLYCONDENSATION; ULTRAVIOLET RADIATION;

CONTACT MODES;

ORGANIC POLYMERS;

1 METHYL 2 PYRROLIDINONE; 1 [1,1 BIS[4 [2 DIAZO 1(2H) NAPHTHALENONE 5 SULFONYLOXY]PHENYL]ETHYL] 4 [1 [4 [2 DIAZO 1(2H) NAPHTHALENONE 5 SULFONYLOXY]PHENYL]METHYLETHYL]BENZENE; 2 AMINOPHENOL; AMIDE; AMINOPHENOL DERIVATIVE; AMMONIUM DERIVATIVE; ANILIDE; BENZENE DERIVATIVE; BENZOIC ACID DERIVATIVE; BENZOXAZOLE DERIVATIVE; BIS(2 AMINOPHENOL); DIPHENYLISOPHTHALATE; HYDROXYBENZANILIDE; PHENYLBENZOATE; PHTHALIC ACID DERIVATIVE; POLY(2 HYDROXYAMIDE); POLY(BENZOXAZOLE); TETRAMETHYLAMMONIUM HYDROXIDE; UNCLASSIFIED DRUG;

ARTICLE; DISSOLUTION; MODEL; PHOTOSENSITIVITY; POLYMERIZATION; PROTON NUCLEAR MAGNETIC RESONANCE; ROOM TEMPERATURE; SYNTHESIS; ULTRAVIOLET RADIATION;

POLYMER; PRECURSOR; SYNTHESIS;

EID: 0037032731     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(02)00784-X     Document Type: Article

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