Chemistry of photoresist materials

Microlithography: Science and Technology, Second Edition

Volumn , Issue , 2007, Pages 503-585

  Ueno, Takumi ^a   Allen, Robert D ^b  

^a Showa Denko Materials Co   (Japan)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 49049097921     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Chapter

References (256)

1. T. Ueno, H. Shiraishi, S. Uchino, T. Sakamizu, and T. Hattori. 1994. Journal of Photopolymer Science and Technology, 7: 397.
2. S. Okazaki. 1993. Applied Surface Science, 70/71: 603.
3. H. Fukuda, T. Terasaea, and S. Okazaki. 1991. Journal of Vacuum Science and Technology B, 9: 3113.
4. H. Fukuda, A. Imai, T. Terasawa, and S. Okazaki. 1991. IEEE Transactions on Electronic Devices, 38: 67.
5. R. Dammel. 1991. Diazonapthoquinone-Based Resists, SPIE tutorial text TT11, SPIE Press.
6. O. Suess. 1994. Justus Liebigs Annalen der Chemie, 556: 65.
7. J. Packansky and J.R. Lyerla. 1979. IBM Journal of Research and Development, 23: 42;
8. J. Packansky. 1979. Polymer Engineering and Science, 20: 1049.
9. N.J. Hacker and N.J. Turro. 1982. Terahedron Letters, 23: 1771.
10. F.A. Vollenbrok, W.P.M. Nijssen, C.M.J. Mutsaers, M.J.H.J. Geomini, M.E. Reuhman, and R.J. Visser. 1989. Polymer Engineering and Science, 29: 928.
11. F.A. Vollenbrok, C.M.J. Mutsaers, and W.P.M. Nijssen. 1989. Polymeric Materials: Science and Engineering, 61: 283.
12. K. Nakamura, S. Udagawa, and K. Honda. 1972. Chemistry Letters, 20: 763.
13. T. Shibata, K. Koseki, T. Yamaoka, M. Yoshizawa, H. Uchiki, and T. Kobayashi. 1988. Journal of Physical Chemistry, 92: 6269.
14. M. Barra, T.A. Fisher, G.J. Cernigliaro, R. Sinta, and J.C. Scaiano. 1992. Journal of the American Chemical Society, 114: 2680.
15. J. Andraos, Y. Chiang, C.-G. Huang, A.J. Kresge, and J.C. Scaiano. 1993. Journal of the American Chemical Society, 115: 10605.
16. K. Tanigaki and T.W. Ebbsen. 1989. Journal of the American Chemical Society, 109: 5883;
17. K. Tanigaki and T.W. Ebbsen. 1989. Journal of Physical Chemistry, 93: 4531.
18. K. Sheats. 1988. IEEE Transactions on Electronic Devices, 35: 129.
19. A. Furuta, M. Hanabata, and Y. Uemura. 1986. Journal of Vacuum Science Technology B, 4: 430;
20. M. Hanabata, A. Furuta, and Y. Uemura. 1986. Proceedings of SPIE, 631: 76;
21. M. Hanabata, A. Furuta, and Y. Uemura. 1986. Proceedings of SPIE, 771: 85.
22. M. Hanabata, Y. Uetani, and A. Furuta. 1988. Proceedings of SPIE, 920: 349.
23. M. Hanabata, Y. Uetani, and A. Furuta. 1989. Journal of Vacuum Science and Technology B, 7: 640.
24. M. Hanabata and A. Furuta. 1990. Proceedings of SPIE, 1262: 476.
25. M. Hanabata, F. Oi, and A. Furuta. 1991. Proceedings of SPIE, 1466: 132.
26. M. Hanabata, F. Oi, and A. Furuta. 1992. Polymer Engineering and Science, 32: 1494.
27. T. Kajita, T. Ota, H. Nemoto, Y. Yumoto, and T. Miura. 1991. Proceedings of SPIE, 1466: 161.
28. K. Honda, B.T. Beauchemin, Jr., RJ. Hurditch, A.J. Blankeney, K. Kawabe, and T. Kokubo. 1990. Proceedings of SPIE, 1262: 493.
29. K. Honda, B.T. Beauchemin, Jr., EA. Fitzgerald, A.T. Jeffries, III, SP. Tadros, A.J. Blankeney, R.J. Hurditch, S. Tan, and S. Sakaguchi. 1991. Proceedings of SPIE, 1466: 141.
30. K. Honda, B.T. Beauchemin, Jr., RJ. Hurditch, A.J. Blankeney, and T. Kokubo. 1992. Proceedings of SPIE, 1672: 305;
31. K. Honda, A.J. Blankeney, R.J. Hurditch, S. Tan, and T. Kokubo. 1992. Proceedings of SPIE, 1925: 197.
32. W.D. Hinsberg and M.L. Guitierrez. 1983. Kodak Microelectronics Interface Seminar, Nov.
33. J.-P. Huang, T.K. Kwei, and A. Resiser. 1989. Proceedings of SPIE, 1086: 74.
34. T.-F. Yeh, H.-Y. Shih, A. Resier, M.A. Toukhy, and B.T. Beauchemin, Jr. 1992. Journal of Vacuum Science Technology B, 10: 715.
35. T.-F. Yeh, H.-Y. Shih, and A. Resier. 1992. Macromolecules, 25: 5345.
36. T.-F. Yeh, A. Resiser, R.R. Dammel, G. Pawlowski, and H. Roeschert. 1993. Macromolecules, 26: 862.
37. H.-Y. Shih, T.-F. Yeh, A. Reiser, R.R. Dammel, H.J. Merrem, and G. Pawlowski. 1994. Macromolecules, 27: 3330.
38. T. Hattori, T. Ueno, H. Shiraishi, N. Hayashi, and T. Iwayanagi. 1991. Japanese Journal of Applied Physics, 30: 3125.
39. R.R. Dammel, M.D. Rahman, P.H. Lu, A. Canize, and V. Elango. 1994. Proceedings of SPIE, 2195: 542.
40. S. Kishimura, A. Yamaguchi, Y. Yamada, and H. Nagata. 1992. Polymer Engineering and Science, 32: 1550.
41. S. Tan, S. Sakaguchi, K. Uenishi, Y. Kawabe, T. Kokubo, and R.J. Hurditch. 1991. Proceedings of SPIE, 1262: 513.
42. H. Nemoto, K. Inomata, T. Ota, Y. Yumoto, T. Miura, and H. Chaanya. 1992. Proceedings of SPIE, 1672: 305.
43. K. Uenishi, Y. Kawabe, T. Kokubo, and A. Blakeney. 1991. Proceedings of SPIE, 1466: 102.
44. K. Uenishi, S. Sakaguchi, Y. Kawabe, T. Kokubo, M.A. Toukhy, A.T. Jeffries, III, SG. Slater, and R.J. Hurditch. 1992. Proceedings of SPIE, 1672: 262.
45. R. Hanawa, Y. Uetani, and M. Hanabata. 1992. Proceedings of SPIE, 1672: 231;
46. R. Hanawa, Y. Uetani, and M. Hanabata. 1992. Proceedings of SPIE, 1925: 227.
47. M. Hanabata. 1994. Advancd Materials, Optics and Electronics, 4: 75.
48. W. Brunsvold, N. Eib, C. Lyons, S. Miura, M. Plat, R. Dammel, O. Evans et al. 1992. Proceedings of SPIE, 1672: 273.
49. P. Trefonas, III and BK. Danielss. 1987. Proceedings of SPIE, 771: 194.
50. H. Ito, C.G. Willson, and J.M.J. Frechet. 1982. Paper presented at the 1982 Symposium on VLSI Technology, Oiso, Japan;
51. Ito, H., C.G. Willson, and J.M.J. Frechet. 1985. US Patent 4,491,628.
52. H. Ito and C.G. Willson. 1983. ACS Symposium Series, 242: 11.
53. H. Steppan, G. Buhr, and H. Vollmann. 1982. Angewandte Chemie, International Edition in English, 21: 455.
54. T. Iwayanagi, T. Ueno, S. Nonogaki, H. Ito, and C.G. Willson. 1988. Advances in chemistry series 218, chap 3.
55. J. Lingnau, R. Dammel, and J. Theis. 1989. Solid State Technology, 32:9, 105;
56. J. Lingnau, R. Dammel, and J. Theis. 1989. Solid State Technology, 32:10, 107.
57. J.R. Sheats. 1990. Solid State Technology, 33:6, 79.
58. A.A. Lamola, C.R. Szmanda, and J.W. Thackeray. 1990. Solid State Technology, 34:8, 53.
59. E. Rechmanis, F.M. Houlihan, O. Nalamasu, and T.X. Neenan. 1991. Chemistry of Materials, 3: 394.
60. J.F. Cameron and J.M.J. Frechhet. 1990. Journal of Organic Chemistry, 55: 5918.
61. C.G. Willson, J.F. Cammeron, S.A. MacDonald, C.-P. Niesert, J.M.J. Frechet, M.K. Leung, and A. Ackman. 1993. Proceedings of SPIE, 1925: 354.
62. J.V. Crivello. 1983. Polymer Engineering and Science, 23: 953;
63. J.V. Crivello. 1983. Advances in Polymer Science, 62: 1.
64. N.P. Hacker and J.L. Dektar. 1990. Journal of Organic Chemistry, 55: 639;
65. N.P. Hacker and J.L. Dektar. 1990. Polymeric Materials: Science and Engineering, 61: 76.
66. N.P. Hacker and J.L. Dektar. 1990. Journal of the American Chemical Society, 112: 6004.
67. J.L. Dektar and N.P. Hacker. 1989. Journal of Photochemistry and Photobiology A: Chemistry, 46: 233.
68. N.P. Hacker, D.V. Leff, and J.L. Dektar. 1990. Molecular Crystals & Liquid Crystals, 183: 505.
69. N.P. Hacker and K.M. Welsh. 1991. Macromolecules, 24: 2137.
70. D.R. Mckean, U. Schaedeli, and S.A. MacDonald. 1989. ACS Symposium Series, 412: 27.
71. D.R. Mckean, U. Schaedeli, P.H. Kasai, and S.A. MacDonald. 1989. Polymeric Materials Science and Engineering, 61: 81.
72. G. Buhr. 1985. European Patent Application EP 0 137 452.
73. G.H. Smith and J.A. Bonham. 1973. US Patent 3,779,778.
74. G. Buhr, R. Dammel, and C. Lindley. 1989. Polymeric Materials Science and Engineering, 61: 269.
75. G. Calabrese, A. Lamola, R. Sinta, and J. Thackeray. 1990. Polymers for Microelectronics, Tokyo, Kodansha, 435.
76. F.M. Houlihan, A. Schugard, R. Gooden, and E. Reichmanis. 1988. Macromolecules, 21: 2001.
77. T.X. Neenan, F.M. Houlihan, E. Reichmanis, J.M. Kometani, B.J. Bachman, and L.F. Thompson. 1989. Proceedings of SPIE, 1086: 2.
78. F.M. Houlihan, T.X. Neenan, E. Reichmanis, J.M. Kometani, and T. Chin. 1991. Chemistry of Materials, 3: 462.
79. T. Yamaoka, M. Nishiki, K. Koseki, and M. Koshiba. 1989. Polymer Engineering and Science, 29: 856.
80. K. Naitoh, K. Yoneyama, and T. Yamaoka. 1992. Journal of Physical Chemistry, 96: 238.
81. T. Ueno, H. Shiraishi, L. Schlegel, N. Hayashi, and T. Iwayanagi. 1990. Polymers for Microelectronics-Science and Technology, Y. Tabata, I. Mita, S. Nonogaki, K. Horie, and S. Tagawa, Eds, Tokyo: Kodansha, p. 413.
82. H. Shiraishi, N. Hayashi, T. Ueno, T. Sakamizu, and F. Murai. 1991. Journal of Vacuum Science and Technology B, 9: 3343.
83. L. Schlegel, T. Ueno, H. Shiraishi, N. Hayashi, and T. Iwayanagi. 1990. Chemistry of Materials, 2: 299.
84. T. Sakamizu, H. Yamaguchi, H. Shiraishi, F. Murai, and T. Ueno. 1993. Journal of Vacuum Science and Technology B, 11: 2812.
85. T. Ueno, L. Schlegel, N. Hayashi, H. Shiraishi, and T. Iwayanagi. 1992. Polymer Engineering and Science, 32: 1511.
86. H. Roechert, C. Eckes, and G. Pawlowski. 1993. Proceedings of SPIE, 1925: 342.
87. G. Berner, R. Kirchmayr, G. Rist, and W. Rutsch. 1986. Journal of Radiation Curing 10.
88. Y. Onishi, H. Niki, Y. Kobayashi, R.H. Hayase, and N. Oyasato. 1991. Journal of Photopolymer Science and Technology, 4: 337.
89. G. Buhr, H. Lenz, and S. Scheler. 1989. Proceedings of SPIE, 1086: 117.
90. J.J. Grunwald, C. Gal, and S. Eidelman. 1990. Proceedings of SPIE, 1262: 444.
91. R. Hayase, Y. Onishi, H. Niki, N. Oyasato, and S. Hayase. 1994. Journal of the Electrochemical Society, 141: 3141.
92. M. Shirai, T. Masuda, M. Tsunooka, and M. Tanaka. 1984. Makromolecular Chemistry, Rapid Communications, 5: 689.
93. M. Shirai and M. Tsunooka. 1990. Journal of Photopolymer Science and Technology, 3: 301.
94. C.A. Renner. 1980. US Patent 4,371,605.
95. W. Brunsvold, R. Kwong, W. Montgomery, W. Moreau, H. Sachdev, and K. Welsh. 1990. Proceedings of SPIE, 1262: 162.
96. W. Brunsvold, W. Montgomery, and B. Hwang. 1990. Proceedings of SPIE, 1262: 162.
97. G. Pawlowski, R. Dammel, C. Lindley, H.-J. Merrem, H. Roeschert, and J. Lingau. 1990. Proceedings of SPIE, 1262: 16.
98. A. Poot, G. Delzenne, R. Pollet, and U. Laridon. 1971. Journal of Photographic Science, 19: 88.
99. T. Aoai, A. Umehara, A. Kamiya, N. Matsuda, and Y. Aotani. 1989. Polymer Engineering and Science, 29: 887.
100. T.W. Green. 1981. Protective Groups in Organic Synthesis, New York: Wiley.
101. J. March. 1985. Advances in Organic Chemistry, 3rd Ed., New York: Wiley;
102. C.K. Ingold. 1985. Structure and Mechanism in Organic Chemistry, 3rd Ed., Ithaca, NY: Cornell University Press.
103. H. Ito. 1992. Japanese Journal of Applied Physics, 31: 4273.
104. R.G. Tarascon, E. Reichmanis, F. Houlihan, A. Schugard, and L. Thompson. 1989. Polymer Engineering and Science, 29: 850.
105. J.M. Kometani, M.E. Galvin, S.A. Heffner, F.M. Houlihan, O. Nalamasu, E. Chin, and E. Reichmanis. 1993. Macromolecules, 26: 2165.
106. R. Schwalm. 1989. Polymeric Materials: Science and Engineering, 61: 278.
107. Y. Kawai, A. Tanaka, and T. Matsuda. 1992. Japanese Journal of Applied Physics, 31: 4316.
108. M.J. O’Brien. 1989. Polymer Engineering and Science, 29: 846.
109. D.R. McKean, S.A. MacDonald, R.D. Johnson, N.J. Clecak, and C.G. Willson. 1990. Chemistry of Materials, 2: 619.
110. T. Kumada, S. Kubota, H. Koezuka, T. Hanawa, S. Kishimura, and H. Nagata. 1991. Journal of Polymer Science and Technology, 4: 469.
111. H. Ban, J. Nakamura, K. Deguchi, and A. Tanaka. 1991. Journal of Vacuum Science and Technology B, 9: 3387.
112. T. Aoai, T. Yamanaka, and T. Kokubo. 1994. Proceedings of SPIE, 2195: 111.
113. N. Kihara, T. Ushirogouchi, T. Tada, T. Naitoh, S. Saitoh, and O. Sasaki. 1992. Proceedings of SPIE, 1672: 194.
114. H. Koyanagi, S. Umeda, S. Fukunaga, T. Kitaori, and K. Nagasawa. 1992. Proceedings of SPIE, 1672: 125.
115. H. Ban, J. Nakamura, K. Deguchi, and A. Tanaka. 1994. Journal of Vacuum Science and Technology B, 12: 3905.
116. S.A.M. Hesp, N. Hayashi, and T. Ueno. 1991. Journal of Applied Polymer Science, 42: 877.
117. T. Sakamizu, H. Shiraishi, H. Yamaguchi, T. Ueno, and N. Hayashi. 1992. Japanese Journal Applied Physics, 31: 4288.
118. T. Hattori, L. Schlegel, A. Imai, N. Hayashi, and T. Ueno. 1993. Optical Engineering, 32: 2368.
119. G.N. Taylor, L.E. Stillwagon, F.M. Houlihan, T.M. Wolf, D.Y. Sogah, and W.R. Hertler. 1991. Journal of Vacuum Science and Technology B, 9: 3348;
120. G.N. Taylor, L.E. Stillwagon, F.M. Houlihan, T.M. Wolf, D.Y. Sogah, and W.R. Hertler. 1991. Chemistry of Materials, 3: 1031.
121. H. Kikuchi, N. Kurata, and K. Hayashi. 1991. Journal of Polymer Science and Technology, 4: 357.
122. C. Mertesdorf, B. Nathal, N. Munzel, H. Holzwarth, and H.T. Schacht. 1994. Proceedings of SPIE, 2195: 246.
123. W.C. Cunningham, Jr. and CE. Park. 1987. Proceedings of SPIE, 771: 32.
124. T. Yamaoka, M. Nishiki, K. Koseki, and M. Koshiba. 1989. Polymer Engineering and Science, 29: 856.
125. M. Murata, T. Takahashi, M. Koshiba, S. Kawamura, and T. Yamaoka. 1990. Proceedings of SPIE, 1262: 8.
126. Y. Jiang and D. Bassett. 1992. Polymeric Materials Science and Engineering, 66: 41.
127. J.M.J. Frechet, E. Eichler, S. Gauthier, B. Kryczka, and C.G. Willson. 1989. ACS Symposium Series, 381: 155.
128. H. Ito, L.A. Pederson, K.N. Chiong, S. Sonchik, and C. Tai. 1989. Proceedings of SPIE, 1086: 11.
129. Y. Onishi, N. Oyasato, H. Niki, R.H. Hayase, Y. Kobayashi, K. Sato, and M. Miyamura. 1992. Journal of Polymer Science and Technology, 5: 47.
130. H. Ito and C.G. Willson. 1983. Polymer Engineering and Science, 23: 1013.
131. H. Ito, M. Ueda, and R. Schwalm. 1988. Journal of Vacuum Science and Technology B, 6: 2259.
132. H. Ito and R. Scwalm. 1989. Journal of the Electrochemical Society, 136: 241.
133. J. Lingnau, R. Dammel, and J. Theis. 1989. Polymer Engineering and Science, 29: 874;
134. G. Pawlowski, K.-J. Przybilla, W. Spiess, H. Wengenroth, and H. Roeschert. 1989. Journal of Photopolymer Science and Technology, 5: 55.
135. H. Roeschert, K.-J. Przybilla, W. Spiess, H. Wegenroth, and G. Pawlowski. 1992. Proceedings of SPIE, 1672: 33.
136. D.R. Mckean, W.D. Hinsberg, T.P. Sauer, C.G. Willson, R. Vicari, and D.J. Gordon. 1990. Journal of Vacuum Science and Technology B, 8: 1466.
137. K.-J. Przybilla, H. Roeschert, W. Spiess, C. Eckes, G. Pawlowski, and R. Dammel. 1991. Proceedings of SPIE, 1466: 174.
138. G. Pawlowski, T. Sauer, R. Dammel, D.J. Gordon, W. Hinsberg, D. McKean, C.R. Lindley et al. 1990. Proceedings of SPIE, 1262: 391.
139. T. Aoai, A. Umehara, A. Kamiya, N. Matsuda, and Y. Aoai. 1989. Polymer Engineering and Science, 29: 887.
140. T. Aoai, Y. Aotani, and A. Umehara. 1992. Journal of Photopolymer Science and Technology, 3: 389.
141. J.M.J. Frechhet, F. Bouchard, F. Houlihan, B. Kryczka, and C.G. Willson. 1985. Polymeric Materials: Science and Engineering, 53: 263.
142. J.M.J. Frechet, T. Iizawa, F. Bouchard, and M. Stanciulescu. 1986. Polymeric Materials: Science and Engineering, 55: 299.
143. J.M.J. Frechet, E. Eichler, M. Stanciulescu, T. Iizawa, F. Bouchard, F.M. Houlihan, and C.G. Willson. 1987. ACS Symposium Series, 346: 138.
144. J.M.J. Frechet, M. Stanciulescu, T. Iizawa, and C.G. Willson. 1989. Polymeric Materials: Science and Engineering, 60: 170.
145. J.M.J. Frechet, C.G. Willson, T. Iizawa, T. Nishikubo, K. Igarashi, and J. Fahey. 1989. ACS Symposium Series, 412: 100.
146. J.M.J. Frechet, J. Fahey, C.G. Willson, T. Iizawa, K. Igarashi, and T. Nishikubo. 1989. Polymeric Materials: Science and Engineering, 60: 174.
147. W.E. Feely, J.C. Imhof, and C.M. Stein. 1986. Polymer Engineering and Science, 26: 1101.
148. A. Burns, H. Luethje, F.A. Vollenbroek, and E.J. Spiertz. 1987. Microelectronic Engineering, 6: 467.
149. H. Roechert, R. Dammel, Ch. Eckes, W. Meier, K.-J. Przybilla, W. Spiess, and G. Pawlowski. 1992. Proceedings of SPIE, 1672: 157.
150. J.W. Thackeray, G.W. Orsula, E.K. Pavelchek, D. Canistro, L.E. Bogan, A.K. Berry, and K.A. Graziano. 1989. Proceedings of SPIE, 1086: 34.
151. H.-Y. Liu, M.P. de Grandpre, and W.E. Feely. 1988. Journal of Vacuum Science and Technology B, 6: 379.
152. J.W. Thackeray, G.W. Orsula, M.M. Rajaratnam, R. Sinta, D. Herr, and E.K. Pavelchek. 1991. Proceedings of SPIE, 1466: 39.
153. M.T. Allen, G.S. Calabrese, A.A. Lamola, G.W. Orsula, M.M. Rajaratnam, R. Sinta, and J.W. Thackeray. 1991. Journal of Photopolymer Science and Technology, 4: 379.
154. A. Yamaguchi, S. Kishimura, K. Tsujita, H. Morimoto, K. Tsukamoto, and H. Nagata. 1993. Journal of Vacuum Science and Technology B, 11: 2867.
155. J.M.J. Frechet, S. Matuszczak, H.D.H. Stoever, C.G. Willson, and B. Reck. 1989. ACS Symposium Series, 412: 74.
156. H.D.H. Stoever, S. Matuszczak, C.G. Willson, and J.M.J. Frechet. 1993. Macromolecules, 24: 1741.
157. J.T. Fahey and J.M.J. Frechet. 1991. Proceedings of SPIE, 1466: 67.
158. S.M. Lee, J.M.J. Frechet, and C.G. Willson. 1994. Macromolecules, 27: 5154.
159. S.M. Lee and J.M.J. Frechet. 1994. Macromolecules, 27: 5160.
160. S.M. Lee, S. Matuszczak, and J.M.J. Frechet. 1994. Chemistry of Materials, 6: 1796.
161. T. Kajita, E. Kobayashi, A. Tsuji, and Y. Kobayashi. 1993. Proceedings of SPIE, 1925: 133.
162. J.C. Dubois, A. Eranian, and E. Datamanti. 1978. In 8th International Conference on Electron and Ion Science and Technology, Seattle, 303.
163. H. Ito and C.G. Willson. 1983. ACS Symposium Series, 242: 11.
164. M. Hatzakis, K.J. Stewart, J.M. Shaw, and S.A. Rishton. 1991. Journal of the Electrochemical Society, 138: 1076.
165. W. Conley, W. Moreau, S. Perreault, G. Spinillo, R. Wood, J. Gelorme, and R. Martino. 1990. Proceedings of SPIE, 1262: 49.
166. M. Toriumi, H. Shiraishi, T. Ueno, N. Hayashi, S. Nonogaki, F. Sato, and K. Kadota. 1987. Journal of the Electrochemical Society, 134: 936.
167. T. Ueno, H. Shiraishi, N. Hayashi, K. Tadano, E. Fukuma, and T. Iwayanagi. 1990. Proceedings of SPIE, 1262: 26.
168. N. Hayashi, K. Tadano, T. Tanaka, H. Shiraishi, T. Ueno, and T. Iwayanagi. 1990. Japanese Journal of Applied Physics, 29: 2632.
169. H. Shiraishi, E. Fukuma, N. Hayashi, K. Tadano, and T. Ueno. 1991. Chemistry of Materials, 3: 621.
170. D.R. Mckean, N.J. Clecak, and L.A. Pederson. 1990. Proceedings of SPIE, 1262: 110.
171. S. Uchino, T. Iwayanagi, T. Ueno, and N. Hayashi. 1991. Proceedings of SPIE, 1466: 429.
172. S. Uchino and C.W. Frank. 1992. Polymer Engineering and Science, 32: 1530.
173. S. Uchino, M. Katoh, T. Sakamizu, and M. Hashimoto. 1992. Microelectronic Engineering, 18: 341.
174. T. Ueno, S. Uchino, K.T. Hattori, T. Onozuka, S. Shirai, N. Moriuchi, M. Hashimoto, and S. Koibuchi. 1994. Proceedings of SPIE, 2195: 173.
175. R. Sooriyakumaran, H. Ito, and E.A. Mash. 1991. Proceedings of SPIE, 1466: 419.
176. H. Ito, R. Sooriyakumaran, Y. Maekawa, and E.A. Mash. 1992. Polymeric Materials: Science and Engineering, 66: 45.
177. J. Crank and G.S. Park, Eds. 1969. Diffusion in Polymers, New York: Academic Press.
178. L. Schlegel, T. Ueno, N. Hayashi, and T. Iwayanagi. 1991. Journal of Vacuum Science and Technology B, 9: 278;
179. L. Schlegel, T. Ueno, N. Hayashi, and T. Iwayanagi. 1991. Japanese Journal of Applied Physics B, 30: 3132.
180. J. Nakamura, H. Ban, K. Deguchi, and A. Tanaka. 1991. Japanese Journal of Applied Physics, 30: 2619.
181. K. Asakawa. 1993. Journal of Photopolymer Science and Technology, 6: 505.
182. T.H. Fedynyshyn, J.W. Thackeray, J.H. Georger, and M.D. Denison. 1994. Journal of Vacuum Science and Technology B, 12: 3888.
183. S.A. MacDonald, N.J. Clecak, H.R. Wendt, C.G. Willson, C.D. Snyder, C.J. Knors, N.B. Deyoe et al. 1991. Proceedings of SPIE, 1466: 2.
184. S.A. MacDonald, W.D. Hinsberg, H.R. Wendt, N.J. Clecak, C.G. Willson, and C.D. Snyder. 1993. Chemistry of Materials, 5: 348.
185. J.G. Maltabes, S.J. Homes, J.R. Morrow, R.L. Barr, M. Hakey, G. Reynolds, C.G. Willson, N.J. Clecak, S.A. MacDonald, and H. Ito. 1990. Proceedings of SPIE, 1262: 2.
186. O. Nalamasu, E. Reichmanis, M. Cheng, V. Pol, J.M. Kometani, F.M. Houlihan, T.X. Nenan et al. 1991. Proceedings of SPIE, 1466: 13.
187. T. Kumada, Y. Tanaka, S. Kubota, H. Koezuka, A. Ueyama, T. Hanawa, and H. Morimoto. 1993. Proceedings of SPIE, 1925: 31.
188. A. Oikawa, N. Santoh, S. Miyata, Y. Hatakenaka, H. Tanaka, and K. Nakagawa. 1993. Proceedings of SPIE, 1925: 92.
189. W.D. Hinsberg, S.A. MacDonald, N.J. Clecak, and C.D. Snyder. 1992. Proceedings of SPIE, 1672: 24.
190. W.D. Hinsberg, S.A. MacDonald, N.J. Clecak, and C.D. Snyder. 1993. Proceedings of SPIE, 1925: 43.
191. W.D. Hinsberg, S.A. MacDonald, N.J. Clecak, and C.D. Snyder. 1994. Chemistry of Materials, 6: 481.
192. D.J.H. Funhoff, H. Binder, and R. Schwalm. 1992. Proceedings of SPIE, 1672: 46.
193. K.-J. Przybilla, Y. Kinoshita, S. Masuda, T. Kudo, N. Suehira, H. Okazaki, G. Pawlowski, M. Padmanabam, H. Roeschert, and W. Spiess. 1993. Proceedings of SPIE, 1925: 76.
194. H. Ito, W.P. England, and S.B. Lundmark. 1992. Proceedings of SPIE, 1672: 2.
195. H. Ito, W.P. England, R. Sooriyakumaran, N.J. Clecak, G. Breyta, W.D. Hinsberg, H. Lee, and D.Y. Yoon. 1993. Journal of Photopolymer Science and Technology, 6: 547.
196. H. Ito, G. Breyta, D. Hofer, R. Sooriyakumaran, K. Petrillo, and D. Seeger. 1994. Journal of Photopolymer Science and Technology, 7: 433.
197. P.J. Paniez, C. Rosilio, B. Mouanda, and F. Vinet. 1994. Proceedings of SPIE, 2195: 14.
198. G.N. Taylor, L.E. Stillwagon, and T. Venkatesan. 1984. Journal of the Electrochemical Society, 131: 1658.
199. T.M. Wolf, G.N. Taylor, T. Venkatesan, and R.T. Kraetsch. 1984. Journal of the Electrochemical Society, 131: 1664.
200. F. Coopman and B. Roland. 1986. Proceedings of SPIE, 631: 34.
201. F. Coopman and B. Roland. 1987. Solid State Technology, 30:6, 93.
202. H. Fujioka, H. Nakajima, S. Kishimura, and H. Nagata. 1990. Proceedings of SPIE, 1262: 554.
203. Y. Yoshida, H. Fujioka, H. Nakajima, S. Kishimura, and H. Nagata. 1991. Journal of Photopolymer Science and Technology, 4: 49.
204. K.-H. Baik, L. Van den hove, A.M. Goethals, M. Op de Beeck, and B. Roland. 1990. Journal of Vacuum Science and Technology B, 8: 1482.
205. J.M. Shaw, M. Hatzakis, E.D. Babich, J.R. Paraszczak, D.F. Witman, and K.J. Stewart. 1989. Journal of Vacuum Science and Technology B, 7: 1709.
206. R.-J. Visser, J.P.W. Schellekens, M.E. Reuhman-Huisken, and L.J. Van Ijzendoorn. 1987. Proceedings of SPIE, 771: 111.
207. C.M.J. Mutsaers, W.P.M. Nijssen, F.A. Vollenbroek, and P.A. Kraakman. 1992. Journal of Vacuum Science and Technology B, 10: 729.
208. B.-J.L. Yang, J.-M. Yang, and K.N. Chiong. 1989. Journal of Vacuum Science and Technology B, 7: 1729.
209. R. Sezi, M. Sebald, R. Leuscher, H. Ahne, S. Birkle, and H. Borndoefer. 1990. Proceedings of SPIE, 1262: 84.
210. M. Sebald, J. Berthold, M. Beyer, R. Leuscher, C. Noelschner, U. Scheler, R. Sezi, H. Ahne, and S. Birkle. 1991. Proceedings of SPIE, 1466: 227.
211. K.-H. Baik, L. Van den hove, and B. Roland. 1990. Journal of Vacuum Science and Technology B, 9: 3399.
212. E. Babich, J. Paraszczak, J. Gelorme, R. McGouey, M. Brady, R. Nunes, and R. Smith. 1991. Microelectronic Engineering, 13: 47.
213. S.A. MacDonald, H. Schlosser, H. Ito, N.J. Clecak, and C.G. Willson. 1991. Chemistry of Materials, 3: 435.
214. S.A. MacDonald, H. Schlosser, H. Ito, N.J. Clecak, C.G. Willson, and J.M.J. Frechet. 1992. Chemistry of Materials, 4: 1346.
215. J.P.W. Schellekens and R.-J. Visser. 1989. Proceedings of SPIE, 1086: 220.
216. J.W. Thackeray, J.F. Bohland, G.W. Orsula, and J. Ferrari. 1989. Journal of Vacuum Science and Technology B, 7: 1620.
217. J. Fahey, J.M.J. Frechet, and Y. Schcham-Diamand. 1994. Journal of Materials Chemistry, 4: 1533.
218. R.D. Allen, G.M. Wallraff, W.D. Hinsberg, and L.L. Simpson. 1991. Journal of Vacuum Science and Technology B, 9: 3357.
219. Y. Kaimoto, K. Nozaki, S. Takechi, and N. Abe. 1992. Proceedings of SPIE, 1672: 66.
220. K. Nozaki, Y. Kaimoto, M. Takahashi, S. Takechi, and N. Abe. 1994. Chemistry of Materials, 6: 1492.
221. K. Yamashita, M. Endo, M. Sasago, N. Nomura, H. Nagano, S. Mizuguchi, T. Ono, and T. Sato. 1993. Journal of Vacuum Science and Technology B, 11: 2692.
222. K. Nakano, K. Maeda, S. Iwasa, J. Yano, Y. Ogura, and E. Hasegawa. 1994. Proceedings of SPIE, 2195: 194.
223. T. Naito, K. Asakawa, N. Shida, T. Ushirogouchi, and M. Nakase. 1994. Japanese Journal of Applied Physics, 33: 7028.
224. M.A. Hartney, D.W. Johnson, and A.C. Spencer. 1991. Proceedings of SPIE, 1466: 238.
225. M.A. Hartney, M.W. Horn, R.R. Kunz, M. Rothschild, and D.C. Shaver. 1992. Microlithography World, May/June: 16.
226. S. Uchino, T. Ueno, S. Migitaka, T. Tanaka, K. Kojima, T. Onozuka, N. Moriuchi, and M. Hashimoto. 1994. In Pro. Reg. Tech. Conf. Photopolymers, Ellenville, New York: SPE, p. 306.
227. H. Ito. 2005. Advances in Polymer Science, 172: 37.
228. W. Hinsberg, G. Wallraff, and R. Allen. 1998. Lithographic resists, in Kirk-Othmer Encyclopedia of Chemical Technology, 4th Ed., pp. 233-280.
229. D. Lee and G. Pawloski. 2002. Journal of Photopolymer Science and Technology, 15:3, 427.
230. H. Ito, G. Breyta, W. Conley, P. Hagerty, J. Thackerey, S. Holmes, R. Nunes, D. Fenzel-Alexander, R. DiPietro, and D. Hofer. 1996. Journal of Photopolymer Science and Technology, 9:4, 557.
231. W. Hinsberg, F. Houle, M. Sanchez, J. Hoffnagle, G. Wallraff, D. Medeiros, G. Gallatin, and J. Cobb. 2003. Proceedings of SPIE, 5039: 1.
232. G. Wallraff, D.R. Medeiros, M. Sanchez, K. Petrillo, W.-S. Huan, C. Rettner, B. Davis et al. 2004. Journal of Vacuum Science and Technology B, 22: 3479.
233. G.M. Wallraff, D.R. Medeiros, C.E. Larson, M. Sanchez, K. Petrillo, W-S. Huang, C. Rettner et al. 2005. Proceedings of SPIE, 5753: 309.
234. P. Naulleau, K.A. Goldberg, E. Anderson, J.P. Cain, P. Denham, B. Hoef, K. Jackson, A.-S. Morlens, S. Rekawa, K. Dean. 2005. Proceeding of SPIE, 5751: 56.
235. R. Allen, W. Conley, and R. Kunz. 1997. Deep UV resist technology, in Handbook of Microlithography, Bellingham, WA: SPIE Press, pp. 321-376.
236. R.D. Allen, G.M. Wallraff, W.D. Hinsberg, W. Conley, and R.R. Kunz. 1993. Journal of Photopolymer Science and Technology, 6:4, 575;
237. G. Wallraff et al. 1993. Journal of Vacuum Science and Technology B, 11:6, 2783.
238. R.D. Allen, W.D. Hinsberg, C.F. Larson, R.D. Johmson, R. DiPietro, G. Breyta, and N. Hacker. 1991. Journal of Vacuum Science and Technology B, 9: 3357.
239. H. Gokan, S. Esho, and Y. Ohnishi. 1983. Journal of the Electrochemical Society, 130: 143.
240. R.R. Kunz, S.C. Palmteer, A.R. Forte, R.D. Allen, G.H. Wallraff, R.A. DiPietro, and D.C. Hofer. 1996. Proceedings of SPIE, 2724: 365.
241. Y. Kaimoto, K. Nozaki, S. Takechi, and N. Abe. 1992. Proceedings of SPIE, 1672: 66.
242. K. Nozaki, K. Watanabe, E. Yao, A. Kotachi, S. Takechi, and I. Hanyu. 1996. Journal of Photopolymer Science and Technology, 9:3, 509.
243. R.D. Allen, J. Opitz, C.E. Larson, T.I. Wallow, R.A. DiPietro, G. Breyta, R. Sooriyakumaran, and D.C. Hofer. 1997. Journal of Photopolymer Science and Technology, 10:3, 503.
244. R.D. Allen, G.M. Wallraff, R.A. DiPietro, D.C. Hofer, and R.R. Kunz. 1995. Proceedings of SPIE, 2438: 474.
245. T. Wallow, F. Houlihan, O. Nalamasu, E. Chandross, T. Neenan, and E. Reichmanis. 1996. Proceedings of SPIE, 2724: 355.
246. K. Patterson, U. Okoroanyanwu, T. Shimokawa, S. Cho, J. Byers, and C.G. Willson. 1998. Proceedings of SPIE, 3333: 425.
247. A. Pasquale, R. Allen, and T. Long. 2001. Macromolecules, 34: 8064.
248. R. Allen, R. Sooriyakumaran, J. Optiz, G. Wallraff, R. DiPietro, G. Breyta, D. Hofer et al. 1996. Proceedings of SPIE, 2724: 334.
249. W. Li, R. Varanasi, M.C. Lawson, R.W. Kwong, K.-J. Chen, H. Ito, H. Trunong et al. 2003. Proceedings of SPIE, 5039: 61.
250. P.R. Varanasi, R.K. Kwong, M. Khojasteh, K. Patel, K-J. Chen, W. Li, M.C. Lawson et al. 2005. Proceedings of SPIE, 5753: 131.
251. T. Hattori, Y. Yokoyama, K. Kimura, R. Yamanaka, T. Tanaka, and H. Fukuda. 2003. Proceedings of SPIE, 5039: 175;
252. Y. Yokoyama, T Hattori, K Kimura, T. Tanaka, and H. Shiraishi. 2003. Journal of Photopolymer Science and Technology, 13: 579.
253. R. Sooriyakumaran, B. Davis, C.E. Larson, P.J. Brock, R.A. DiPietro, T.I. Wallow, E.F. Connor et al. 2004. Proceedings of SPIE, 5376: 71.
254. R. Dammel, G. Pawlowski, A. Romano, F.M. Houlihan, W.-K. Kim, R. Sakamuri, D. Abdallah, M. Padmanaban, M.D. Rahman, and D. McKenzie. 2005. Journal of Photopolymer Science and Technology, 18:5, 593;
255. S. Kanna, H. Inabe, K. Yamamoto, S. Tarutani, H. Kanda, K. Mizutani, K. Kitada, S. Uno, and Y. Kawabe. 2005. Journal of Photopolymer Science and Technology, 18:5, 603.
256. R.D. Allen, P.J. Brock, L. Sundberg, C.E. Larson, G.M. Wallraff, W.D. Hinsberg, J. Meute, T. Shimokawa, T. Chiba, and M. Slezak. 2005. Journal of Photopolymer Science and Technology, 18:5, 615.