|
Volumn 46, Issue 1, 2007, Pages 28-30
|
Acid diffusion length corresponding to post exposure bake time and temperature
|
Author keywords
193nm; Acid diffusion length; Chemically amplified resist; Post exposure bake
|
Indexed keywords
AMPLIFICATION;
CATALYSTS;
CHEMICAL SHIFT;
DIFFUSION;
ACID DIFFUSION LENGTH;
CHEMICALLY AMPLIFIED RESIST;
PHOTOACID GENERATORS;
POST EXPOSURE BAKE;
LITHOGRAPHY;
|
EID: 34547895155
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.46.28 Document Type: Article |
Times cited : (6)
|
References (4)
|