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Volumn 46, Issue 1, 2007, Pages 28-30

Acid diffusion length corresponding to post exposure bake time and temperature

Author keywords

193nm; Acid diffusion length; Chemically amplified resist; Post exposure bake

Indexed keywords

AMPLIFICATION; CATALYSTS; CHEMICAL SHIFT; DIFFUSION;

EID: 34547895155     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.28     Document Type: Article
Times cited : (6)

References (4)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.