Synthesis of transparent poly(o-hydroxy amide) derivative in i-line region for photosensitive polybenzoxazole

Journal of Photopolymer Science and Technology

Volumn 18, Issue 2, 2005, Pages 319-320

  Ogura, Tomohito ^a   Fukukawa, Ken Ichi ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

High transparency; Low k materials; Photosensitive polymer; Poly(o hydroxy amide); Polybenzoxazole; Time dependent density functional theory

Indexed keywords

EID: 22144478660     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.319     Document Type: Article

References (8)

1. R. Rubner Adv. Mater., 2 (1990) 452.
2. K. Fukukawa, Y. Shibasaki, and M. Ueda, Macromolecules, 37 (2004) 8256.
3. . K. Fukukawa, Y. Shibasaki, and M. Ueda, Polym. J., 37 (2005)14.
4. W. D. Joseph, J. C. Abed, T. H. Yoon, and J. E. McGrath, ACS Polym. Prep., 35 (1994) 551.
5. F. Toyokawa, K. Fukukawa, Y. Shibasaki, S. Ando, and M. Ueda, J. Polym. Sci., Part A: Polym. Chem., in press.
6. H. Seino, H. Iguchi, O. Haba, Y. Ohba, and M. Ueda, Polym. J., 31 (1999) 822.
7. F. Toyokawa, Y. Shibasaki, S. Ando, and M. Ueda, submitted.
8. K. Ebara, Y. Shibasaki, and M. Ueda, J. Photopolym. Sci. Technol., 16 (2003) 287.