Negative-type chemically amplified photosensitive novolac

Journal of Photopolymer Science and Technology

Volumn 21, Issue 1, 2008, Pages 161-164

  Saito, Yuta ^a   Mizoguchi, Katsuhisa ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chemically amplified resists; Cross linker; Novolac resin; Photoacid generator

Indexed keywords

EID: 49049092827     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.161     Document Type: Article

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