Negative-working photosensitive poly(phenylene ether) based on poly(2,6-dimethyl-1,4-phenylene ether), a cross-linker, and a photoacid generator

Macromolecules

Volumn 43, Issue 6, 2010, Pages 2832-2839

  Mizoguchi, Katsuhisa ^a   Higashihara, Tomoya ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATION TYPE; CROSSLINKER; HIGH CONTRAST; HIGH THERMAL; LOW DIELECTRIC CONSTANTS; LOW WATER; NEGATIVE-WORKING; PHOTOACID GENERATORS; POLY(PHENYLENE ETHER); POST-EXPOSURE; RESIST SYSTEMS; THERMAL STABILITY; UV LIGHT;

AROMATIC COMPOUNDS; CURING; ETHERS; LIGHT SENSITIVE MATERIALS; PHOTOSENSITIVITY; POLYCONDENSATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; THERMOGRAVIMETRIC ANALYSIS; THICK FILMS; TOLUENE; WATER ABSORPTION; XYLENE;

PHOTORESISTORS;

EID: 77951919156     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma902526r     Document Type: Article

References (25)

1. Haruhi, R. J. Jpn. Inst. Electron. Packag. 2007, 5, 353.
2. Tsukui, T. J. Jpn. Inst. Electron. Packag. 2008, 11, 317.
3. Morita, K.; Takanezawa, S.; Takekoshi, M.; Sakai, K. Hitachi Chem. Tech. Rep. 2008, 51, 29.
4. Fukukawa, K.; Ueda, M. Polym. J. 2008, 40, 208.
5. Hasegawa, M.; Tsujimura, Y.; Koseki, K.; Miyazaki, T. Polym. J. 2008, 40, 56.
6. Fukukawa, K.; Ueda, M. Polym. J. 2006, 38, 405.
7. Fukukawa, K.; Ueda, M. Macromolecules 2006, 39, 2100.
8. Ogura, T.; Yamaguchi, K.; Shibasaki, Y.; Ueda, M. Polym. J. 2007, 39, 245.
9. Mizoguchi, K.; Higashihara, T.; Ueda, M. Macromolecules 2009, 42, 1024.
10. Mizoguchi, K.; Higashihara, T.; Ueda, M. Macromolecules 2009, 42, 3780.
11. Mizoguchi, K.; Shibasaki, Y.; Ueda, M. J. Photopolym. Sci. Technol. 2007, 20, 181.
12. Fukukawa, K.; Shibasaki, Y.; Ueda, M. Polym. Adv. Technol. 2006, 17, 131.
13. Ohe, M.; Kawamura, T.; Katoh, K.; Matsutani, H.; Hattori, T. Hitachi Chem. Tech. Rep. 2007, 48, 27.
14. Fukukawa, K.; Ogura, T.; Shibasaki, Y.; Ueda, M. Chem. Lett. 2005, 34, 1372.
15. Liu, G., J.; Nakamura, Y.; Ogura, T.; Shibasaki, Y.; Ando, S.; Ueda, M. Chem. Mater. 2008, 20, 273.
16. Ueda, M.; Toyoda, H.; Nakayama, T.; Abe, T. J. Polym. Sci., Part A: Polym. Chem. 1996, 34, 109.
17. Mizoguchi, K.; Ueda, M. Polym. J. 2008, 40, 645.
18. Mizoguchi, K.; Shibasaki, Y.; Ueda, M. J. Polym. Sci., Part A: Polym. Chem. 2008, 46, 4949.
19. Naitoh, K.; Yamaoka, T.; Umehara, A. Chem. Lett. 1991, 11, 1869.
20. Naitoh, K.; Kanai, K.; Yamaoka, T. J. Photopolym. Sci. Technol. 1991, 4, 411.
21. Sekine, Y.; Boekelheide, V. J. Am. Chem. Soc. 1981, 103, 1777.
22. Hennrich, G.; Lynch, M. V.; Anslyn, V. E. Chem. Eur. J. 2002, 8, 2274.
23. Kilway, V. K.; Siegel, S. J. Tetrahedron 2001, 57, 3615.
24. Bodwell, J. G.; Bridson, N. J.; Chen, N. S.; Poirier, A. R. J. Am. Chem. Soc. 2001, 123, 4704.
25. Tsuchiya, K.; Shibasaki, Y.; Ueda, M. Polym. J. 2007, 39, 442.