A novel negative-working photoimaging material based on a base-amplifying silicone resin tethering phenylsulfonylethyl groups

Chemistry Letters

Volumn 36, Issue 11, 2007, Pages 1308-1309

  Inoue, Satoru ^a   Arimitsu, Koji ^a   Abe, Yoshimoto ^a   Ichimura, Kunihiro ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b TOHO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36849035370     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2007.1308     Document Type: Article

References (9)

1. a) K. Arimitsu, M. Miyamoto, K. Ichimura, Angew. Chem. 2000, 112, 3567.
2. b) K. Arimitsu, K. Ichimura, J. Mater. Chem. 2004, 14, 336.
3. a) Y. Morikawa, K. Arimitsu, T. Gunji, Y. Abe, K. Ichimura, J. Photopolym. Sci. Technol. 2003, 16, 81.
4. b) K. Arimitsu, H. Kobayashi, M. Furutani, T. Gunji, Y. Abe, K. Ichimura, J. Photopalym. Sci. Technol. 2004, 17, 19.
5. K. Arimitsu, Y. Morikawa, T. Gunji, Y. Abe, K. Ichimura, Proc. RadTech Asia '03, RadTech, Japan, 2003, p. 312.
6. M. Miyamoto, K. Arimitsu, K. Ichimura, J. Photopolym. Sci. Technol. 1999, 12, 317.
7. The synthesis and evaluation procedure is given in the Supporting Information, which is available electronically at the CSJ Journal Web site, http://www.csj.jp./journals/chem-lett/index.html.
8. a) E. J. Urankar, J. M. J. Fréchet, Chem. Mater. 1997, 9, 2861.
9. b) J. M. J. Fréchet, M. Leung, E. J. Urankar, C. G. Willson, J. F. Cameron, S. A. MacDonald, C. P. Niesert, Chem. Mater. 1997, 9, 2887.