New synthetic route for photosensitive poly(benzoxazole)

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 40, Issue 20, 2002, Pages 3399-3405

  Ebara, Kazuya ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

High temperature materials; Imaging; Photolithography; Photoresists; Photosensitive compound; Poly(benzoxazole)

Indexed keywords

HIGH TEMPERATURE MATERIALS; ISOPHTHALALDEHYDE; PHOTOSENSITIVE COMPOUND; POLYBENZOXAZOLE; POLYHYDROXYAZOMETHINE; TETRAMETHYLAMMONIUM HYDROXIDE;

CONDENSATION REACTIONS; HEAT TREATMENT; PHOTOLITHOGRAPHY; PHOTORESISTS; PHOTOSENSITIVITY; SOLUTIONS; TEMPERATURE; TOLUENE; ULTRAVIOLET RADIATION;

ORGANIC POLYMERS;

POLYMER SCIENCE;

EID: 0037108368     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.10432     Document Type: Article

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