Negative-type photosensitive poly(phenylene ether) based on poly(2,6-dimethyl-1,4-phenylene ether), a crosslinker, and a photoacid generator

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 46, Issue 15, 2008, Pages 4949-4958

  Mizoguchi, Katsuhisa ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Crosslinker; Dielectric properties; Low dielectric constant; Negative type; Photoacid generator; Photoresists; Photosensitive polymer; Poly(phenylene ether)

Indexed keywords

AROMATIC COMPOUNDS; ETHERS; LIGHT SENSITIVE MATERIALS; OPTICAL PROPERTIES; ORGANIC COMPOUNDS; PHENOLS; PHOTORESISTORS; PHOTOSENSITIVITY; POLYCYCLIC AROMATIC HYDROCARBONS;

CROSS LINKERS; GOOD COMPATIBILITY; HIGH SENSITIVITY (HS); METHOXYMETHYL (MOM); PHOTO ACID GENERATOR (PAG); POLY(PHENYLENE ETHER);

PHOTORESISTS;

EID: 47549106299     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.22626     Document Type: Article

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