Electron-beam-induced deposition of platinum at low landing energies

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2460-2463

  Botman, A ^a   De Winter, D A M ^b   Mulders, J J L ^c  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b UTRECHT UNIVERSITY   (Netherlands)

^c Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; ELECTRON BEAMS; LANDING; PLATINUM;

DISSOCIATION PROCESSES; FOCUSED ELECTRON BEAMS; INDUCED DEPOSITIONS; SECONDARY ELECTRONS;

ELECTRONS;

EID: 57249103622     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2976576     Document Type: Article

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