SCOPUS 정보 검색 플랫폼

Volumn 86, Issue 2, 2012, Pages

Reactive magnetron sputter deposition of (Ti,Cu)N nano-crystalline thin films: Modeling of particle and energy flux toward the substrate

(1) Rahmati, A a,b

a VALI E ASR UNIVERSITY OF RAFSANJAN (Iran)

b UNIVERSITY OF TABRIZ (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

ACCEPTOR CENTERS; BAND GAP ENERGY; BINARY COLLISION MODELS; BONDING ENVIRONMENT; CHEMICAL BONDINGS; CHEMICAL COMPOSITIONS; CRYSTALLINE QUALITY; ENERGY FLUXES; EXTINCTION COEFFICIENTS; FINAL ENERGY; GASPHASE; GLASS SLIDES; INITIAL ENERGY; MAGNETRON SPUTTER DEPOSITION; MODEL-BASED OPC; MOLECULAR NITROGEN; MONTE CARLO SIMULATION; NANOCRYSTALLINE THIN FILMS; NITROGEN CONTENT; OPTICAL STUDY; POTASSIUM BROMIDE; PREFERENTIAL ORIENTATION; REACTIVE DC MAGNETRON SPUTTERING; SI (1 1 1); SPHERICAL GRAINS; SPUTTERED PARTICLES; SPUTTERING YIELDS; SUBSTRATE TEMPERATURE; SURFACE TEMPERATURES; TOTAL ENERGY FLUX; TRANSPORT AND RANGE OF IONS IN MATTERS; WEIGHTED AVERAGES;

BROMINE COMPOUNDS; CHEMICAL BONDS; CRYSTALLINE MATERIALS; ENERGY DISSIPATION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTELLIGENT SYSTEMS; MAGNETRON SPUTTERING; METALLIC FILMS; NITROGEN; PHASE STABILITY; POTASSIUM; QUARTZ; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

SUBSTRATES;

EID: 84864701575 PISSN: 00318949 EISSN: 14024896 Source Type: Journal
DOI: 10.1088/0031-8949/86/02/025301 Document Type: Article

Times cited : (6)

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