Copper nitride thin film prepared by reactive radio-frequency magnetron sputtering

Journal of Applied Physics

Volumn 98, Issue 10, 2005, Pages

  Yue, G H ^a   Yan, P X ^a   Liu, J Z ^a   Wang, M X ^a   Li, M ^a   Yuan, X M ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FLOW RATES; GLASS SUBSTRATES;

ARGON; ATOMIC FORCE MICROSCOPY; DEPOSITION; MAGNETRON SPUTTERING; NITROGEN; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; THIN FILMS;

COPPER COMPOUNDS;

EID: 28744453745     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2132507     Document Type: Article

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