Copper nitride (Cu3N) thin films deposited by RF magnetron sputtering

Journal of Crystal Growth

Volumn 286, Issue 2, 2006, Pages 407-412

  Wang, J ^a   Chen, J T ^a   Yuan, X M ^a   Wu, Z G ^a   Miao, B B ^a   Yan, P X ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

A1. Structure; B1. Copper nitride film; B2. Physical properties

Indexed keywords

COPPER COMPOUNDS; NITROGEN; PHYSICAL PROPERTIES; PYROLYSIS;

COPPER NITRIDE FILM; OPTICAL ENERGY GAP; STRUCTURE;

THIN FILMS;

EID: 29444449894     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.10.107     Document Type: Article

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