Reactive DC magnetron sputter deposited copper nitride nano-crystalline thin films: Growth and characterization

Vacuum

Volumn 86, Issue 8, 2012, Pages 1067-1072

  Hadian, F ^a   Rahmati, A ^b   Movla, H ^a   Khaksar, M ^a  

^a UNIVERSITY OF TABRIZ   (Iran)

^b VALI E ASR UNIVERSITY OF RAFSANJAN   (Iran)

Author keywords

First principle calculation; Nitrogen excess; Reactive magnetron sputtering; Vacant interstitial sites

Indexed keywords

ABSORPTION COEFFICIENTS; ELECTRICAL RESISTIVITY; ENGINEERING METHODS; EXTINCTION COEFFICIENTS; FIRST PRINCIPLE CALCULATIONS; INTERSTITIAL SITES; IR TRANSMITTANCE SPECTROSCOPY; MAGNETRON SPUTTER; MEASURED DATA; MIXED ORIENTATIONS; NANOCRYSTALLINE THIN FILMS; NITROGEN CONTENT; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL BAND GAP ENERGY; OPTICAL STUDY; PHASE ANALYSIS; POLYCRYSTALLINE; REACTIVE DC MAGNETRON SPUTTERING; REACTIVE MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPES; SEMICONDUCTING BEHAVIOR; SINGLE PHASE; SOLID SOLUBILITIES; SUBSTRATE TEMPERATURE; XRD;

ELECTRIC CONDUCTIVITY; GRAIN GROWTH; MAGNETRON SPUTTERING; NITROGEN; OPTICAL BAND GAPS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

SEMICONDUCTING FILMS;

EID: 84858161638     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.09.001     Document Type: Article

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