Ionized physical vapor deposition of titanium nitride: A global plasma model

Journal of Applied Physics

Volumn 91, Issue 7, 2002, Pages 4040-4048

  Tao, K ^a   Mao, D ^a   Hopwood, J ^a  

^a Northeastern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC NITROGEN; DENSITY OF ELECTRONS; DIFFUSION BARRIER LAYERS; EXPERIMENTAL MEASUREMENTS; ION DENSITY; IONIZATION FRACTIONS; IONIZED PHYSICAL VAPOR DEPOSITION; MODE OF OPERATIONS; MOLECULAR STATE; NITRIDED; NITROGEN FLOW RATES; PLASMA MODEL; REACTOR WALLS;

ELECTRIC DISCHARGES; ELECTRON TEMPERATURE; NITROGEN; PHYSICAL VAPOR DEPOSITION; TANTALUM COMPOUNDS; TITANIUM; TITANIUM NITRIDE; VAPORS;

ARGON;

EID: 0036536193     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1455139     Document Type: Article

References (45)

1. W. M. Holber, J. S. Logan, J. J. Grabarz, J. T. C. Yeh, J. B. O. Caughman, A. Sugerman, and F. E. Turene, J. Vac. Sci. Technol. A 11, 2903 (1993). jva JVTAD6 0734-2101
2. J. C. Helmer, K. F. Lai, and R. L. Anderson, U.S. Patent No. 5,482,611 (January 9, 1996).
3. M. Yamashita, J. Vac. Sci. Technol. A 7, 151 (1989). jva JVTAD6 0734-2101
4. S. M. Rossnagel and J. Hopwood, Appl. Phys. Lett. 63, 3285 (1993). apl APPLAB 0003-6951
5. J. Foster, J. Vac. Sci. Technol. A (in press).
6. J. Hopwood, Phys. Plasmas 5, 1624 (1998). php PHPAEN 1070-664X
7. M. Li, M. A. Vyvoda, and D. B. Graves, in Ionized Physical Vapor Deposition, edited by J. Hopwood (Academic, San Diego, CA, 2000), pp. 209-245.
8. J. Lu and M. J. Kushner, J. Appl. Phys. 89, 878 (2001). jap JAPIAU 0021-8979
9. J. Lu and M. J. Kushner, J. Appl. Phys. 87, 7198 (2000). jap JAPIAU 0021-8979
10. M. Dickson and J. Hopwood, J. Vac. Sci. Technol. A 15, 2307 (1997). jva JVTAD6 0734-2101
11. D. Mao, K. Tao, and J. Hopwood, J. Vac. Sci. Technol. A 20 (in press).
12. I. Petrov, A. Myers, J. E. Greene, and J. R. Abelson, J. Vac. Sci. Technol. A 12, 2846 (1994). jva JVTAD6 0734-2101
13. C. Lee and M. A. Lieberman, J. Vac. Sci. Technol. A 13, 368 (1995). jva JVTAD6 0734-2101
14. J. Hopwood and F. Qian, J. Appl. Phys. 78, 758 (1995). jap JAPIAU 0021-8979
15. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), p. 140.
16. V. A. Godyak, Soviet Radio Frequency Discharge Research (Delphic, Fall Church, VA, 1986), p. 79ff.
17. B. E. Cherrington, Gaseous Electronics and Gas Lasers (Pergamon, Oxford, UK, 1979), p. 119.
18. R. A. Young, J. Chem. Phys. 34, 1295 (1961). jcp JCPSA6 0021-9606
19. G. Black, J. Chem. Phys. 60, 3526 (1974). jcp JCPSA6 0021-9606
20. A. H. Futch and F. A. Grant, Phys. Rev. 104, 356 (1956). phr PHRVAO 0031-899X
21. T. Holstein, Phys. Rev. 83, 1159 (1951). phr PHRVAO 0031-899X
22. J. Hopwood, Plasma Sources Sci. Technol. 3, 460 (1994). pst PSTEEU 0963-0252
23. G. Zhong and J. Hopwood, J. Vac. Sci. Technol. B 17, 405 (1999). jvb JVTBD9 0734-211X
24. E. Brook, M. F. A. Harrison, and A. C. H. Smith, J. Phys. B 11, 3115 (1978). jbm JPAMA4 0022-3700
25. T. D. Mark, J. Chem. Phys. 63, 3731 (1975). jcp JCPSA6 0021-9606
26. P. C. Cosby, J. Chem. Phys. 98, 9544 (1993). jcp JCPSA6 0021-9606
27. D. I. Slovetsky, Chemical Reaction Mechanisms in Nonequilibrium Plasmas (Nauka, Moscow, 1980), p. 179.
28. D. L. Albritton, At. Data Nucl. Data Tables 22, 1 (1978). adn ADNDAT 0092-640X
29. L. G. Piper, J. Chem. Phys. 91, 864 (1989). jcp JCPSA6 0021-9606
30. D. E. Shemansky, J. Chem. Phys. 51, 689 (1969). jcp JCPSA6 0021-9606
31. D. C. Cartwright, S. Trajmar, A. Chutjian, and W. Williams, Phys. Rev. A 16, 1041 (1977). pra PLRAAN 1050-2947
32. R. A. Young, J. Chem. Phys. 34, 1295 (1961). jcp JCPSA6 0021-9606
33. A. A. Viggiano and Robert A. Morris, J. Chem. Phys. 99, 3526 (1993). jcp JCPSA6 0021-9606
34. F. J. de Heer, R. H. Jansen, and W. van der Kaay, J. Phys. B 12, 979 (1979). jbm JPAMA4 0022-3700
35. L. Vriens, Phys. Lett. 8, 260 (1964). phl PHLTAM 0031-9163
36. D. Rapp and P. Englander-Golden, J. Chem. Phys. 43, 1464 (1965). jcp JCPSA6 0021-9606
37. M. A. Lennon, K. L. Bell, H. B. Gilbody, J. G. Hughes, A. E. Kingston, M. J. Murray, and F. J. Smith, J. Chem. Phys. 17, 1285 (1988). jcp JCPSA6 0021-9606
38. 2 is the estimated Penning ionization cross section from L. A. Riseberg, W. F. Parks, and L. D. Schearer, Phys. Rev. A 8, 1962 (1973); pra PLRAAN 1050-2947
39. H. W. Ellis, R. Y. Pai, E. W. McDaniel, E. A. Mason, and L. A. Viehland, At. Data Nucl. Data Tables 17, 177 (1976). adn ADNDAT 0092-640X
40. L. A. Viehland and E. A. Mason, At. Data Nucl. Data Tables 60, 37 (1995). adn ADNDAT 0092-640X
41. H. W. Ellis, M. G. Thackson, E. W. McDaniel, and E. A. Mason, At. Data Nucl. Data Tables 31, 113 (1984). adn ADNDAT 0092-640X
42. CRC Handbook of Chemistry and Physics, 79th ed. (Chemical Rubber Corp., Boca Raton, FL, 1998).
43. D. Spence, J. Phys. B 12, L179 (1979). jbm JPAMA4 0022-3700
44. A. Garscadden, Swarm Studies and Inelastic Electron-molecule Collisions (Springer, New York, 1987), p. 415.
45. E. W. McDaniel, Collision Phenomena in Ionized Gases (Wiley, New York, 1964), p. 735.