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Volumn 222, Issue 4, 2001, Pages 767-772
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Structural and optical characterization of Cu3N films prepared by reactive RF magnetron sputtering
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Author keywords
[No Author keywords available]
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Indexed keywords
COPPER COMPOUNDS;
CRYSTAL ORIENTATION;
MAGNETRON SPUTTERING;
NITRIDES;
NITRIFICATION;
PARTIAL PRESSURE;
PRESSURE EFFECTS;
SEMICONDUCTING FILMS;
SILICON WAFERS;
SPUTTER DEPOSITION;
THERMAL EFFECTS;
TRANSPARENCY;
COPPER NITRIDE;
OPTICAL FILMS;
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EID: 0342526957
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(00)00968-4 Document Type: Article |
Times cited : (113)
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References (11)
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