|
Volumn 252, Issue 22, 2006, Pages 8001-8004
|
Study of the structure and electrical properties of the copper nitride thin films deposited by pulsed laser deposition
|
Author keywords
Characterization methods; Copper nitride; Pulsed laser deposition; Thin films
|
Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
COPPER COMPOUNDS;
NITROGEN;
PULSED LASER DEPOSITION;
SILICON;
X RAY DIFFRACTION ANALYSIS;
X RAY PHOTOELECTRON SPECTROSCOPY;
CHARACTERIZATION METHODS;
COPPER NITRIDE THIN FILMS;
STOICHIOMETRIC FILMS;
THIN FILMS;
|
EID: 33748601848
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2005.10.007 Document Type: Article |
Times cited : (71)
|
References (19)
|