메뉴 건너뛰기




Volumn 252, Issue 22, 2006, Pages 8001-8004

Study of the structure and electrical properties of the copper nitride thin films deposited by pulsed laser deposition

Author keywords

Characterization methods; Copper nitride; Pulsed laser deposition; Thin films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COPPER COMPOUNDS; NITROGEN; PULSED LASER DEPOSITION; SILICON; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33748601848     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.10.007     Document Type: Article
Times cited : (71)

References (19)
  • 1
    • 33748616302 scopus 로고    scopus 로고
    • S.T. Oyama, in: S. Ted Oyama (Ed.), The Chemistry of Transition Metal Carbides and Nitrides, 1996, pp. 1-27.
  • 2
    • 33748626309 scopus 로고    scopus 로고
    • JCPDS-ICSS, International Centre for Diffraction Data, Newtown Square, PA, USA.
  • 15
    • 33748633543 scopus 로고    scopus 로고
    • Celref for windows unit cell refinement program, developed by J. Laugier, B. Bochu, Ecole Nationale Supérieure de Physique de Grenoble (INPG), Domaine Universitaire BP 46, 38402 Saint Martin d'Hères. Http://www.inpg.fr/LMGP.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.