DC triode sputtering deposition and characterization of N-rich copper nitride thin films: Role of chemical composition

Journal of Crystal Growth

Volumn 310, Issue 19, 2008, Pages 4362-4367

  Gordillo, N ^a   Gonzalez Arrabal, R ^b   Martin Gonzalez, M S ^b   Olivares, J ^c   Rivera, A ^b   Briones, F ^b   Agullo Lopez F ^a   Boerma, D O ^a  

^a CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

^b INSTITUTO DE MICROELECTRÓNICA DE MADRID   (Spain)

^c INSTITUTO DE ÓPTICA   (Spain)

Author keywords

A1. Optical properties; A1. X ray diffraction; B1. Nitrides; B2. Semiconducting materials

Indexed keywords

ION BEAMS; NITRIDES; OPTICAL PROPERTIES; SPUTTERING; THIN FILMS; TRIODES; X RAY DIFFRACTION;

CHEMICAL COMPOSITIONS; COPPER NITRIDE THIN FILMS; DEPOSITION PARAMETERS; ELECTRICAL MEASUREMENT; INTRINSIC SEMICONDUCTORS; NITROGEN PARTIAL PRESSURES; SEMICONDUCTING MATERIALS; SPUTTERING PARAMETERS;

COPPER COMPOUNDS;

EID: 51649111613     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.07.051     Document Type: Article

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