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Volumn 85, Issue 9, 2011, Pages 853-860
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Reactive DC magnetron sputter deposited Ti-Cu-N nano-composite thin films at nitrogen ambient
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Author keywords
N interstitial; N rich; Reactive magnetron sputtering; Ti incorporation; Ti Cu N nano composite
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Indexed keywords
ABSORPTION COEFFICIENTS;
ATOMIC RATIO;
CRYSTALLINE PHASIS;
ENERGY DISPERSIVE X-RAY;
EXTINCTION COEFFICIENTS;
GLASS SLIDES;
IN-VACUUM;
INTERSTITIAL NITROGEN;
MAGNETRON SPUTTER;
METALLIC BEHAVIORS;
MULTICOMPONENTS;
N INTERSTITIAL;
N-RICH;
NEAR-IR;
NITRIDED;
NITROGEN AMBIENT;
NITROGEN PRESSURE;
OPTICAL ENERGY GAP;
OPTICAL STUDY;
POTASSIUM BROMIDE;
REACTIVE DC MAGNETRON SPUTTERING;
REACTIVE MAGNETRON SPUTTERING;
RHENIUM OXIDE;
SCANNING ELECTRON MICROSCOPES;
SI (1 1 1);
SPUTTERING PRESSURES;
THERMAL STABILITY;
TI DOPED;
TI-INCORPORATION;
TITANIUM ATOMS;
UNIT CELLS;
XRD;
AGGLOMERATION;
ATOMIC SPECTROSCOPY;
ATOMS;
BROMINE COMPOUNDS;
COMPOSITE FILMS;
COPPER;
CRYSTALLITES;
MAGNETRON SPUTTERING;
METALLIC FILMS;
NANOCOMPOSITES;
NITROGEN;
ORGANIC POLYMERS;
POTASSIUM;
PRESSURE EFFECTS;
QUARTZ;
REFRACTIVE INDEX;
REVERSE ENGINEERING;
RHENIUM;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
THIN FILMS;
TITANIUM;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
NANOCOMPOSITE FILMS;
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EID: 79952446687
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2010.12.010 Document Type: Article |
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Times cited : (30)
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References (53)
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