Novel model for film growth based on surface temperature developing during magnetron sputtering

Surface and Coatings Technology

Volumn 202, Issue 3, 2007, Pages 486-493

  Shaginyan, L R ^a   Kim, Youn J ^b   Han, Jeon G ^b   Britun, N V ^b   Musil, J ^c   Belousov, I V ^d  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^b Sungkyunkwan University   (South Korea)

^c UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^d INSTITUTE OF METAL PHYSICS   (Ukraine)

Author keywords

Electron microscopy; Sputter deposition; Surface temperature

Indexed keywords

CALORIMETRY; ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; METALLIC FILMS; SUBSTRATES; TEMPERATURE; THERMAL CONDUCTIVITY;

FILM STRUCTURE; SURFACE TEMPERATURE;

FILM GROWTH;

CALORIMETRY; ELECTRON MICROSCOPY; FILM GROWTH; MAGNETRON SPUTTERING; METALLIC FILMS; SUBSTRATES; TEMPERATURE; THERMAL CONDUCTIVITY;

EID: 35549008030     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.06.016     Document Type: Article

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