Remote plasma treatment of Si surfaces: Enhanced nucleation in low-temperature chemical vapor deposition

Applied Physics Letters

Volumn 95, Issue 14, 2009, Pages

  Kumar, Navneet ^a   Yanguas Gil, Angel ^a   Daly, Scott R ^b   Girolami, Gregory S ^b   Abelson, John R ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LOW TEMPERATURES; MGO FILMS; MICROELECTRONICS TECHNOLOGY; NUCLEATION DENSITIES; ORDERS OF MAGNITUDE; PLASMA TREATMENT; PRE-TREATMENT; REMOTE ARGON PLASMA; REMOTE PLASMA TREATMENT; REMOTE PLASMAS; RMS ROUGHNESS; SI SURFACES; SI(1 0 0);

ARGON; DESORPTION; HAFNIUM; MICROELECTRONICS; NUCLEATION; PLASMA DEPOSITION; PLASMAS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 70349900265     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3243980     Document Type: Article

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