Batch reactor kinetic studies of tungsten LPCVD from silane and tungsten hexafluoride

Journal of the Electrochemical Society

Volumn 143, Issue 1, 1996, Pages 296-302

  Bell, David A ^a,c   McConica, Carol M ^a   Baker, Kevin L ^a   Kuchta, Elizabeth ^b  

^a Engineering Research Center and Hydraulics Laboratory   (United States)

^b WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c UNIVERSITY OF WYOMING   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; HYDROGEN; INTEGRATED CIRCUIT MANUFACTURE; MASS SPECTROMETERS; PRESSURE EFFECTS; REACTION KINETICS; REGRESSION ANALYSIS; SILANES; TUNGSTEN COMPOUNDS;

DISSOCIATIVE SILANE ADSORPTION; LIQUID PHASE CHEMICAL VAPOR DEPOSITION; MULTIPLE REGRESSION ANALYSIS; THERMAL ACTIVATION; TUNGSTEN HEXAFLUORIDE;

TUNGSTEN;

EID: 0029732685     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836426     Document Type: Article

References (6)

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